Equipments Details
Description
Metal Reactive-ion etching - RIE - for substrates that can be chemically etched with chlorine and their compounds.
Model: Plasmalab 100 - ICP 380, up to 200mm
Model: Plasmalab 100 - ICP 380, up to 200mm
Details
Name | Metal Reactive Ion Etcher and Strip |
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Acquisition date | 04/1/10 |
Manufacturers | Oxford Instruments Group Plc |
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