Calculated based on number of publications stored in Pure and citations from Scopus
1991 …2024

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  • 2021

    Lead-carbon battery negative electrodes: Mechanism and materials

    Zhang, W. L., Yin, J., Alshareef, H. N., Lin, H. B. & Qiu, X. Q., Jan 1 2021, 11th International Conference on Lead-Acid Batteries, LABAT 2021. Lead-Acid Batteries Department (LABD), p. 123-126 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • 2020

    KAUSTat: A Wireless, Wearable, Open-Source Potentiostat for Electrochemical Measurements

    Ahmad, R., Surya, S. G., Sales, J. B., Mkaouar, H., Catunda, S. Y. C., Belfort, D. R., Lei, Y., Wang, Z. L., Baeumner, A., Wolfbeis, O. S., Alshareef, H. N. & Salama, K. N., Jan 15 2020, 2019 IEEE SENSORS. IEEE

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    10 Scopus citations
  • 2011

    Band-edge effective work functions by controlling HfO2/TiN interfacial composition for gate-last CMOS

    Hinkle, C. L., Galatage, R. V., Chapman, R. A., Vogel, E. M., Alshareef, H. N., Freeman, C., Wimmer, E., Niimi, H., Li-Fatou, A., Chambers, J. J. & Shaw, J. B., 2011, Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications. 2 ed. Electrochemical Society Inc., p. 285-295 11 p. (ECS Transactions; vol. 35, no. 2).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    3 Scopus citations
  • 2010

    Dielectric properties of PMMA-SiO2 hybrid films

    Morales-Acosta, M. D., Quevedo-López, M. A. Q., Alshareef, H. N., Gnade, B. E. & Ramírez-Bon, R., Mar 2010, Materials Science Forum. Trans Tech Publications, p. 25-28 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    7 Scopus citations
  • Dipole controlled metal gate with hybrid low resistivity cladding for gate-last CMOS with low Vt

    Hinkle, C. L., Galatage, R. V., Chapman, R. A., Vogel, E. M., Alshareef, H. N., Freeman, C. M., Wimmer, E., Niimi, H., Li-Fatou, A. V., Shaw, J. B. & Chambers, J. J., Jun 2010, 2010 Symposium on VLSI Technology. Institute of Electrical and Electronics Engineers (IEEE), p. 183-184 2 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    16 Scopus citations
  • Structural and morphological properties of HfxZr 1-xO2 thin films prepared by Pechini route

    García-Cerda, L. A., Puente-Urbina, B. A., Quevedo-López, M. A. Q., Gnade, B. E., Baldenegro-Pérez, L. A., Alshareef, H. N. & Hernández-Landaverde, M. A., Mar 2010, Materials Science Forum. Trans Tech Publications, p. 113-116 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • Study of hafnium (IV) oxide nanoparticles synthesized by polymerized complex and polymer precursor derived sol-gel methods

    Ramos-González, R., García-Cerda, L. A., Alshareef, H. N., Gnade, B. E. & Quevedo-López, M. A. Q., Mar 2010, Materials Science Forum. Trans Tech Publications, p. 75-78 4 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    8 Scopus citations
  • 2009

    First principles study of metal/Bi2Te3 interfaces: Implications to reduce contact resistance

    Xiong, K., Wang, W., Alshareef, H. N., Gupta, R. P., White, J. B., Gnade, B. E. & Cho, K., Dec 1 2009, 2009 MRS Spring Meeting: Materials and Devices for Thermal-to-Electric Energy Conversion. p. 103-108 6 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    5 Scopus citations
  • Novel materials and integration schemes for CMOS-based circuits for flexible electronics

    Quevedo-Lopez, M. A., Gowrisanker, S., Allee, D. R., Venugopal, S., Krishna, R., Kaftanoglu, K., Alshareef, H. N. & Gnade, B. E., 2009, ECS Transactions - ULSI Process Integration 6. 7 ed. Electrochemical Society Inc., p. 503-511 9 p. (ECS Transactions; vol. 25, no. 7).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    2 Scopus citations
  • 2007

    Oxygen transfer from metal gate to high-k gate dielectric stack: Interface structure & property changes

    Ha, J. H., Alshareef, H., Chambers, J., Sun, Y., Pianetta, P., McIntyre, P. C. & Colombo, L., 2007, ECS Transactions - 5th International Symposium on High Dielectric Constant Materials and Gate Stacks. 4 ed. Electrochemical Society Inc., p. 213-218 6 p. (ECS Transactions; vol. 11, no. 4).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    1 Scopus citations
  • 2006

    Band edge n-MOSFETs with high-k/metal gate stacks scaled to EOT=0.9nm with excellent carrier mobility and high temperature stability

    Kirsch, P. D., Quevedo-Lopez, M. A., Krishnan, S. A., Krug, C., AlShareef, H., Park, C. S., Harris, R., Moumen, N., Neugroschel, A., Bersuker, G., Lee, B. H., Wang, J. G., Pant, G., Gnade, B. E., Kim, M. J., Wallace, R. M., Jur, J. S., Lichtenwalner, D. J., Kingon, A. I. & Jammy, R., 2006, 2006 International Electron Devices Meeting Technical Digest, IEDM. 4154281. (Technical Digest - International Electron Devices Meeting, IEDM).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    18 Scopus citations
  • Reliability characteristics of metal/high-k PMOS with top interface engineered Band Offset Dielectric (BOD)

    Rusty Harris, H., Krishnan, S., Wen, H. C., Alshareef, H., Rao, A., Solis, L., Majhi, P., Choi, R., Lee, B. H., Bersuker, G. & Brown, G. A., 2006, 2006 IEEE International Reliability Physics Symposium Proceedings, 44th Annual. p. 661-662 2 p. 4017253. (IEEE International Reliability Physics Symposium Proceedings).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    3 Scopus citations
  • Simplified manufacturable band edge metal gate solution for NMOS without a capping layer

    Harris, H. R., Alshareef, H., Wen, H. C., Krishnan, S., Choi, K., Luan, H., Heh, D., Park, C. S., Park, H. B., Hussain, M., Ju, B. S., Kirsch, P. D., Song, S. C., Majhi, P., Lee, B. H. & Jammy, R., 2006, 2006 International Electron Devices Meeting Technical Digest, IEDM. 4154282. (Technical Digest - International Electron Devices Meeting, IEDM).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    8 Scopus citations
  • Systematic gate stack optimization to maximize mobility with HfSiON EOT scaling

    Quevedo-Lopez, M. A., Kirsch, P. D., Krishnan, S., Alshareef, H. N., Barnett, J., Harris, H. R., Neugroschel, A., Aguirre-Tostado, F. S., Gnade, B. E., Kim, M. J., Wallace, R. M. & Lee, B. H., 2006, ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference. IEEE Computer Society, p. 113-116 4 p. 4099869. (ESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference; vol. 2006-January).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    3 Scopus citations
  • Thermally stable N-metal gate MOSFETs using La-incorporated HfSiO dielectric

    Alshareef, H. N., Harris, H. R., Wen, H. C., Park, C. S., Huffman, C., Choi, K., Luan, H. F., Majhi, P., Lee, B. H., Jammy, R., Lichtenwalner, D. J., Jur, J. S. & Kingon, A. I., 2006, 2006 Symposium on VLSI Technology, VLSIT - Digest of Technical Papers. p. 7-8 2 p. 1705190. (Digest of Technical Papers - Symposium on VLSI Technology).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    59 Scopus citations
  • 2005

    A systematic study of the influence of nitrogen in tuning the effective work function of nitrided metal gates

    Majhi, P., Wen, H. C., Choi, K., Alshareef, H., Huffman, C. & Lee, B. H., 2005, 2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA - TECH, Proceedings of Technical Papers. p. 105-106 2 p. T66. (2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA-TECH, Proceedings of Technical Papers).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    8 Scopus citations
  • Demonstration of high performance transistors with PVD metal gate

    Harris, H. R., Wen, H. C., Choi, K., Alshareef, H., Luan, H., Senzaki, Y., Young, C. D., Song, S. C., Zhang, Z., Bersuker, G., Majhi, P. & Lee, B. H., 2005, Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference. p. 431-434 4 p. 1546677. (Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference; vol. 2005).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

  • Evaluation and integration of metal gate electrodes for future generation dual metal CMOS

    Majhi, P., Wen, H. C., Alshareef, H., Choi, K., Harris, R., Lysaght, P., Luan, H., Senzaki, Y., Song, S. C., Lee, B. H. & Ramiller, C., 2005, 2005 International Conference on Integrated Circuit Design and Technology, ICICDT. Institute of Electrical and Electronics Engineers Inc., p. 69-72 4 p. D1. (2005 International Conference on Integrated Circuit Design and Technology, ICICDT).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    14 Scopus citations
  • Growth mechanism of ALD-TiN and the thickness dependence of work function

    Choi, K., Lysaght, P., Alshareef, H., Wen, H. C., Huffman, C., Harris, R., Luan, H., Matthews, K., Majhi, P. & Lee, B. H., 2005, 2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA - TECH, Proceedings of Technical Papers. p. 103-104 2 p. T65. (2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA-TECH, Proceedings of Technical Papers).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    2 Scopus citations
  • In-line control and rapid process development of nitrided gate oxides

    Rogers, D., Laaksonen, T., Varghese, A., Otten, C., Kasner, M., Alshareef, H., Kuan, R. & Bevan, M., Sep 9 2005, CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2005 - International Conference. p. 172-176 5 p. (AIP Conference Proceedings; vol. 788).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Open Access
  • Integration of dual metal gate CMOS with TaSiN (NMOS) and Ru (PMOS) gate electrodes on HfO 2 gate dielectric

    Zhang, Z. B., Song, S. C., Huffman, C., Barnett, J., Moumen, N., Alshareef, H., Majhi, P., Hussain, M., Akbar, M. S., Sim, J. H., Bae, S. H., Sassman, B. & Lee, B. H., 2005, 2005 Symposium on VLSI Technology, Digest of Technical Papers. p. 50-51 2 p. 1469208. (Digest of Technical Papers - Symposium on VLSI Technology; vol. 2005).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    38 Scopus citations
  • On the structure-property inter-relationships of metal gate electrodes for future generation CMOS

    Majhi, P., Alshareef, H., Wen, H. C., Choi, K., Lysaght, P., Huffman, C., Luan, H., Harris, R., Lee, B. H. & Ramiller, C., 2005, Proceedings of the 4th International Conference on Semiconductor Technology, ISTC 2005. p. 56-61 6 p. (Proceedings - Electrochemical Society; vol. PV 2005-12).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

  • Physical characterization of novel metal electrodes for Hf-based transistors

    Lysaght, P. S., Wen, H. C., Alshareef, H., Choi, K., Harris, R., Luan, H., Senzaki, Y., Lian, G., Campin, M., Clark, M., Foran, B., Majhi, P. & Lee, B. H., Sep 9 2005, CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2005 - International Conference. p. 136-140 5 p. (AIP Conference Proceedings; vol. 788).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Open Access
  • The effect of metal thickness, overlayer and high-k surface treatment on the effective work function of metal electrode

    Choi, K., Wen, H. C., Alshareef, H., Harris, R., Lysaght, P., Luan, H., Majhi, P. & Lee, B. H., 2005, Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference. p. 101-104 4 p. 1546595. (Proceedings of ESSDERC 2005: 35th European Solid-State Device Research Conference; vol. 2005).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    38 Scopus citations
  • Work function engineering of RuHf alloys as gate electrodes for future generation dual metal CMOS

    Wen, H. C., Majhi, P., Alshareef, H., Huffman, C., Choi, K., Lysaght, P., Harris, R., Luan, H., Lee, B. H., Yamada, N. & Wickramanayaka, S., 2005, 2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA - TECH, Proceedings of Technical Papers. p. 107-108 2 p. T67. (2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA-TECH, Proceedings of Technical Papers).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    3 Scopus citations
  • 2002

    Gate dielectrics for high performance and low power CMOS SoC applications

    Cubaynes, F., Dachs, C., Detcheverry, C., Zegers, A., Venezia, V., Schmitz, J., Stolk, P., Jurczak, M., Henson, K., Degraeve, R., Rothschild, A., Conard, T., Petry, J., Da Rold, M., Schaekers, M., Badenes, G., Date, L., Pique, D., Al-Shareef, H. & Murto, R., 2002, European Solid-State Device Research Conference. Gnani, E., Baccarani, G. & Rudan, M. (eds.). IEEE Computer Society, p. 427-430 4 p. (European Solid-State Device Research Conference).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

  • RPN oxynitride gate dielectrics for 90nm low power CMOS applications

    Veloso, A., Jurczak, M., Cubaynes, F. N., Rooyackers, R., Mertens, S., Rothschild, A., Schaekers, M., Al-Shareef, H. N., Murto, R. W., Dachs, C. J. J. & Badenes, G., 2002, European Solid-State Device Research Conference. Gnani, E., Baccarani, G. & Rudan, M. (eds.). IEEE Computer Society, p. 159-162 4 p. (European Solid-State Device Research Conference).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    8 Scopus citations
  • 2001

    Integration of high-k gate stack systems into planar CMOS process flows

    Huff, H. R., Agarwal, A., Kim, Y., Perrymore, L., Riley, D., Barnett, J., Sparks, C., Freiler, M., Gebara, G., Bowers, B., Chen, P., Lysaght, P., Nguyen, B., Lim, S., Bersuker, G., Zeitzoff, P., Brown, G., Young, C., Foran, B., Shaapur, F., & 11 othersHou, A., Lim, C., Alshareef, H. N., Borthakur, S., Derro, D. J., Bergmann, R., Larson, L. A., Gardner, M. I., Gutt, J., Murto, R. W. & Torres, K., 2001, Extended Abstracts of International Workshop on Gate Insulator, IWGI 2001. Institute of Electrical and Electronics Engineers Inc., p. 2-11 10 p. 967538. (Extended Abstracts of International Workshop on Gate Insulator, IWGI 2001).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    19 Scopus citations
  • 2000

    Ultra-thin high quality oxynitride formed by NH3nitridation and high pressure O2Re-oxidation

    Luo, T. Y., Watt, V. H. C., Al-Shareef, H. N., Brown, G. A., Karamcheti, A., Jackson, M., Huff, H. R., Evans, B. & Kwong, D. L., 2000, ESSDERC 2000 - Proceedings of the 30th European Solid-State Device Research Conference. Grunbacher, H., Crean, G. M., Lane, W. A. & McCabe, F. A. (eds.). IEEE Computer Society, p. 404-407 4 p. 1503730. (European Solid-State Device Research Conference).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review