3D microstructures fabricated by partially opaque X-ray lithography masks

S. Cabrini; M. Gentili; E. Di Fabrizio; A. Gerardino; A. Nottola; Q. Leonard; L. Mastrogiacomo

doi:10.1016/S0167-9317(00)00387-7

3D microstructures fabricated by partially opaque X-ray lithography masks

S. Cabrini^*, M. Gentili, E. Di Fabrizio, A. Gerardino, A. Nottola, Q. Leonard, L. Mastrogiacomo

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

10 Scopus citations

Abstract

X-ray lithography has several advantages over optical or e-beam techniques, since x-ray proximity printing can overcome typical limitations of such techniques, enabling the imaging of ultra thick resist layers (micro-mechanical application). In this work we will discuss the fabrication of a multilevel x-ray mask capable of producing a radiation dose modulation when used in a typical proximity x-ray lithography set-up. The aim of our investigation is develop a process that in a single x-ray exposure can replicate a multilevel mask profile. The mask was realised by e-beam lithography and made by a number of overlapped gold layers, so producing a modulation of the x-ray dose absorption. We describe in some detail the process for the fabrication of the mask and the first result of the x-ray exposure.

Original language	English (US)
Pages (from-to)	599-602
Number of pages	4
Journal	Microelectronic Engineering
Volume	53
Issue number	1
DOIs	https://doi.org/10.1016/S0167-9317(00)00387-7
State	Published - Jun 2000
Externally published	Yes
Event	25th International Conference on Micro- and Nano-Engineering - Rome, Italy Duration: Sep 21 1999 → Sep 23 1999

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(00)00387-7

Cite this

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title = "3D microstructures fabricated by partially opaque X-ray lithography masks",

abstract = "X-ray lithography has several advantages over optical or e-beam techniques, since x-ray proximity printing can overcome typical limitations of such techniques, enabling the imaging of ultra thick resist layers (micro-mechanical application). In this work we will discuss the fabrication of a multilevel x-ray mask capable of producing a radiation dose modulation when used in a typical proximity x-ray lithography set-up. The aim of our investigation is develop a process that in a single x-ray exposure can replicate a multilevel mask profile. The mask was realised by e-beam lithography and made by a number of overlapped gold layers, so producing a modulation of the x-ray dose absorption. We describe in some detail the process for the fabrication of the mask and the first result of the x-ray exposure.",

author = "S. Cabrini and M. Gentili and {Di Fabrizio}, E. and A. Gerardino and A. Nottola and Q. Leonard and L. Mastrogiacomo",

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note = "25th International Conference on Micro- and Nano-Engineering ; Conference date: 21-09-1999 Through 23-09-1999",

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T1 - 3D microstructures fabricated by partially opaque X-ray lithography masks

AU - Cabrini, S.

AU - Gentili, M.

AU - Di Fabrizio, E.

AU - Gerardino, A.

AU - Nottola, A.

AU - Leonard, Q.

AU - Mastrogiacomo, L.

PY - 2000/6

Y1 - 2000/6

N2 - X-ray lithography has several advantages over optical or e-beam techniques, since x-ray proximity printing can overcome typical limitations of such techniques, enabling the imaging of ultra thick resist layers (micro-mechanical application). In this work we will discuss the fabrication of a multilevel x-ray mask capable of producing a radiation dose modulation when used in a typical proximity x-ray lithography set-up. The aim of our investigation is develop a process that in a single x-ray exposure can replicate a multilevel mask profile. The mask was realised by e-beam lithography and made by a number of overlapped gold layers, so producing a modulation of the x-ray dose absorption. We describe in some detail the process for the fabrication of the mask and the first result of the x-ray exposure.

AB - X-ray lithography has several advantages over optical or e-beam techniques, since x-ray proximity printing can overcome typical limitations of such techniques, enabling the imaging of ultra thick resist layers (micro-mechanical application). In this work we will discuss the fabrication of a multilevel x-ray mask capable of producing a radiation dose modulation when used in a typical proximity x-ray lithography set-up. The aim of our investigation is develop a process that in a single x-ray exposure can replicate a multilevel mask profile. The mask was realised by e-beam lithography and made by a number of overlapped gold layers, so producing a modulation of the x-ray dose absorption. We describe in some detail the process for the fabrication of the mask and the first result of the x-ray exposure.

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DO - 10.1016/S0167-9317(00)00387-7

M3 - Conference article

AN - SCOPUS:0034206467

SN - 0167-9317

VL - 53

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JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1

T2 - 25th International Conference on Micro- and Nano-Engineering

Y2 - 21 September 1999 through 23 September 1999

ER -

3D microstructures fabricated by partially opaque X-ray lithography masks

Abstract

ASJC Scopus subject areas

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