TY - JOUR
T1 - A nontransferring dry adhesive with hierarchical polymer nanohairs
AU - Jeong, H. E.
AU - Lee, J.-K.
AU - Kim, H. N.
AU - Moon, S. H.
AU - Suh, K. Y.
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledged KAUST grant number(s): KUK-F1-037-02
Acknowledgements: We thank Dr. Khademhosseini for his enthusiastic discussion and comments. This work was supported by the Korea Science and Engineering Foundation through Nano R&D Program Grant 2007-02605, the Micro Thermal System Research Center of Seoul National University, National Research Laboratory Program Grant M10104000095-01J0000-04210, and the Center for Ultramicrochemical Process Systems. This work was also supported in part by King Abdullah University of Science and Technology Program KUK-F1-037-02 and a Korea Research Foundation Grant funded by the Korean Government Ministry of Education and Human Resource Development Grant KRF-J03000.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.
PY - 2009/3/20
Y1 - 2009/3/20
N2 - We present a simple yet robust method for fabricating angled, hierarchically patterned high-aspect-ratio polymer nanohairs to generate directionally sensitive dry adhesives. The slanted polymeric nanostructures were molded from an etched polySi substrate containing slanted nanoholes. An angled etching technique was developed to fabricate slanted nanoholes with flat tips by inserting an etch-stop layer of silicon dioxide. This unique etching method was equipped with a Faraday cage system to control the ion-incident angles in the conventional plasma etching system. The polymeric nanohairs were fabricated with tailored leaning angles, sizes, tip shapes, and hierarchical structures. As a result of controlled leaning angle and bulged flat top of the nanohairs, the replicated, slanted nanohairs showed excellent directional adhesion, exhibiting strong shear attachment (approximately 26 N/cm(2) in maximum) in the angled direction and easy detachment (approximately 2.2 N/cm(2)) in the opposite direction, with a hysteresis value of approximately 10. In addition to single scale nanohairs, monolithic, micro-nanoscale combined hierarchical hairs were also fabricated by using a 2-step UV-assisted molding technique. These hierarchical nanoscale patterns maintained their adhesive force even on a rough surface (roughness
AB - We present a simple yet robust method for fabricating angled, hierarchically patterned high-aspect-ratio polymer nanohairs to generate directionally sensitive dry adhesives. The slanted polymeric nanostructures were molded from an etched polySi substrate containing slanted nanoholes. An angled etching technique was developed to fabricate slanted nanoholes with flat tips by inserting an etch-stop layer of silicon dioxide. This unique etching method was equipped with a Faraday cage system to control the ion-incident angles in the conventional plasma etching system. The polymeric nanohairs were fabricated with tailored leaning angles, sizes, tip shapes, and hierarchical structures. As a result of controlled leaning angle and bulged flat top of the nanohairs, the replicated, slanted nanohairs showed excellent directional adhesion, exhibiting strong shear attachment (approximately 26 N/cm(2) in maximum) in the angled direction and easy detachment (approximately 2.2 N/cm(2)) in the opposite direction, with a hysteresis value of approximately 10. In addition to single scale nanohairs, monolithic, micro-nanoscale combined hierarchical hairs were also fabricated by using a 2-step UV-assisted molding technique. These hierarchical nanoscale patterns maintained their adhesive force even on a rough surface (roughness
UR - http://hdl.handle.net/10754/597351
UR - http://www.pnas.org/cgi/doi/10.1073/pnas.0900323106
UR - http://www.scopus.com/inward/record.url?scp=65249190864&partnerID=8YFLogxK
U2 - 10.1073/pnas.0900323106
DO - 10.1073/pnas.0900323106
M3 - Article
C2 - 19304801
SN - 0027-8424
VL - 106
SP - 5639
EP - 5644
JO - Proceedings of the National Academy of Sciences
JF - Proceedings of the National Academy of Sciences
IS - 14
ER -