A novel X-ray mask concept for mix&match lithography fabrication of MOS devices by synchrotron radiation lithography

E. Di Fabrizio^*, L. Grella, M. Gentili, M. Baciocchi, L. Mastrogiacomo, Sang Soo Choi, Young Jin Jeon, Hyung Joun Yoo, Hai Bin Chung

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review