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A scalable and highly manufacturable single metal gate/high-k CMOS integration for sub-32nm technology for LSTP applications
C. S. Park, M. M. Hussain, J. Huang, C. Park, K. Tateiwa*, C. Young, H. K. Park, Melvin Cruz, D. Gilmer, Kelly Rader, J. Price, P. Lysaght, D. Heh, G. Bersuker, P. D. Kirsch, H. H. Tseng, R. Jammy
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
12
Scopus
citations