A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist

Qinghuang Lin; Thomas Steinhäusler; Logan Simpson; Michelle Wilder; David R. Medeiros; C. Grant Willson; Jennifer Havard; Jean M.J. Fréchet

doi:10.1021/cm9604165

A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist

Qinghuang Lin, Thomas Steinhäusler, Logan Simpson, Michelle Wilder, David R. Medeiros, C. Grant Willson^*, Jennifer Havard, Jean M.J. Fréchet

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

45 Scopus citations

Abstract

This paper describes an "environmentally friendly", water-castable, water-developable photoresist system. The chemically amplified negative-tone resist system consists of three water-soluble components: a polymer, poly(methyl acrylamidoglycolate methyl ether), [poly(MAGME)]; a photoacid generator, (2,4-dihydroxyphenyl)dimethylsulfonium triflate, and a cross-linker, 1,4-butanediol. In the three-component resist system, the acid generated by photolysis of the photoacid generator catalyzes the cross-linking of poly(MAGME) in the exposed regions during postexposure baking, thus rendering the exposed regions insoluble in water. Negative-tone relief images are obtained by developing with pure water. The resist is able to resolve 1 μm line/space features (1:1 aspect ratio) with a deep-UV exposure dose of 100 mJ/cm² (dose to print). The resist can be used to generate etched copper relief images on printed circuit boards using aqueous sodium persulfate as the etchant. The mechanism of cross-linking has been investigated by model compound studies using ¹³C NMR.

Original language	English (US)
Pages (from-to)	1725-1730
Number of pages	6
Journal	Chemistry of Materials
Volume	9
Issue number	8
DOIs	https://doi.org/10.1021/cm9604165
State	Published - 1997
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Materials Chemistry

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@article{15259fda9cc24182b48ac12dc8481c82,

title = "A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist",

abstract = "This paper describes an {"}environmentally friendly{"}, water-castable, water-developable photoresist system. The chemically amplified negative-tone resist system consists of three water-soluble components: a polymer, poly(methyl acrylamidoglycolate methyl ether), [poly(MAGME)]; a photoacid generator, (2,4-dihydroxyphenyl)dimethylsulfonium triflate, and a cross-linker, 1,4-butanediol. In the three-component resist system, the acid generated by photolysis of the photoacid generator catalyzes the cross-linking of poly(MAGME) in the exposed regions during postexposure baking, thus rendering the exposed regions insoluble in water. Negative-tone relief images are obtained by developing with pure water. The resist is able to resolve 1 μm line/space features (1:1 aspect ratio) with a deep-UV exposure dose of 100 mJ/cm2 (dose to print). The resist can be used to generate etched copper relief images on printed circuit boards using aqueous sodium persulfate as the etchant. The mechanism of cross-linking has been investigated by model compound studies using 13C NMR.",

author = "Qinghuang Lin and Thomas Steinh{\"a}usler and Logan Simpson and Michelle Wilder and Medeiros, {David R.} and Willson, {C. Grant} and Jennifer Havard and Fr{\'e}chet, {Jean M.J.}",

year = "1997",

doi = "10.1021/cm9604165",

language = "English (US)",

volume = "9",

pages = "1725--1730",

journal = "Chemistry of Materials",

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T1 - A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist

AU - Lin, Qinghuang

AU - Steinhäusler, Thomas

AU - Simpson, Logan

AU - Wilder, Michelle

AU - Medeiros, David R.

AU - Willson, C. Grant

AU - Havard, Jennifer

AU - Fréchet, Jean M.J.

PY - 1997

Y1 - 1997

N2 - This paper describes an "environmentally friendly", water-castable, water-developable photoresist system. The chemically amplified negative-tone resist system consists of three water-soluble components: a polymer, poly(methyl acrylamidoglycolate methyl ether), [poly(MAGME)]; a photoacid generator, (2,4-dihydroxyphenyl)dimethylsulfonium triflate, and a cross-linker, 1,4-butanediol. In the three-component resist system, the acid generated by photolysis of the photoacid generator catalyzes the cross-linking of poly(MAGME) in the exposed regions during postexposure baking, thus rendering the exposed regions insoluble in water. Negative-tone relief images are obtained by developing with pure water. The resist is able to resolve 1 μm line/space features (1:1 aspect ratio) with a deep-UV exposure dose of 100 mJ/cm2 (dose to print). The resist can be used to generate etched copper relief images on printed circuit boards using aqueous sodium persulfate as the etchant. The mechanism of cross-linking has been investigated by model compound studies using 13C NMR.

AB - This paper describes an "environmentally friendly", water-castable, water-developable photoresist system. The chemically amplified negative-tone resist system consists of three water-soluble components: a polymer, poly(methyl acrylamidoglycolate methyl ether), [poly(MAGME)]; a photoacid generator, (2,4-dihydroxyphenyl)dimethylsulfonium triflate, and a cross-linker, 1,4-butanediol. In the three-component resist system, the acid generated by photolysis of the photoacid generator catalyzes the cross-linking of poly(MAGME) in the exposed regions during postexposure baking, thus rendering the exposed regions insoluble in water. Negative-tone relief images are obtained by developing with pure water. The resist is able to resolve 1 μm line/space features (1:1 aspect ratio) with a deep-UV exposure dose of 100 mJ/cm2 (dose to print). The resist can be used to generate etched copper relief images on printed circuit boards using aqueous sodium persulfate as the etchant. The mechanism of cross-linking has been investigated by model compound studies using 13C NMR.

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EP - 1730

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 8

ER -

A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist

Abstract

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