ALD of advanced high-k and metal gate stacks for MOS devices

James Gutt, Sundar Gopalan, George A. Brown, Paul D. Kirsch, Jeff J. Peterson, Mark I. Gardner, Hong Jyh Li, Patrick Lysaght, Husam N. Alshareef, Kisik Choi, Craig Huffinan, Huang Chun Wen, Prashant Majhi, Byoung Hun Lee, Hood Chatham, Seung Park, Sidi Lanee, Lawrence Bartholomew, Yoshihide Senzaki^*