Alternative approaches for high-k/metal gate CMOS: Low temperature process (gate last) and SiGe channel

C. S. Park, M. M. Hussain, K. Tateiw, J. Huang, J. Lin, T. Ngai, S. Lian, K. Rader, B. Taylor, P. D. Kirsch, R. Jammy

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

8 Scopus citations

Fingerprint

Dive into the research topics of 'Alternative approaches for high-k/metal gate CMOS: Low temperature process (gate last) and SiGe channel'. Together they form a unique fingerprint.

Engineering

Keyphrases

Material Science