TY - GEN
T1 - Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface
AU - Ji, Dengxin
AU - Chen, Borui
AU - Zeng, Xie
AU - Moein, Tania
AU - Song, Haomin
AU - Zhang, Nan
AU - Gan, Qiaoqiang
AU - Cartwright, Alexander
N1 - Generated from Scopus record by KAUST IRTS on 2022-09-13
PY - 2015/1/1
Y1 - 2015/1/1
N2 - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
AB - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
UR - https://opg.optica.org/abstract.cfm?URI=FiO-2015-FTh3F.3
UR - http://www.scopus.com/inward/record.url?scp=85085850387&partnerID=8YFLogxK
U2 - 10.1364/fio.2015.fth3f.3
DO - 10.1364/fio.2015.fth3f.3
M3 - Conference contribution
SN - 9781943580033
BT - Proceedings of Frontiers in Optics 2015, FIO 2015
PB - OSA - The Optical [email protected]
ER -