Automatic procedure for aberration compensation in digital holographic microscopy and applications to specimen shape compensation

Tristan Colomb; Etienne Cuche; Florian Charrière; Jonas Kühn; Nicolas Aspert; Frédéric Montfort; Pierre Marquet; Christian Depeursinge

doi:10.1364/AO.45.000851

Automatic procedure for aberration compensation in digital holographic microscopy and applications to specimen shape compensation

Tristan Colomb^*, Etienne Cuche, Florian Charrière, Jonas Kühn, Nicolas Aspert, Frédéric Montfort, Pierre Marquet, Christian Depeursinge

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

423 Scopus citations

Abstract

We present a procedure that compensates for phase aberrations in digital holographic microscopy by computing a polynomial phase mask directly from the hologram. The phase-mask parameters are computed automatically without knowledge of physical values such as wave vectors, focal lengths, or distances. This method enables one to reconstruct correct and accurate phase distributions, even in the presence of strong and high-order aberrations. Examples of applications are shown for microlens imaging and for compensating for the deformations associated with a tilted thick plate. Finally we show that this method allows compensation for the curvature of the specimen, revealing its surface defects and roughness. Examples of applications are shown for microlenses and metallic sphere imaging.

Original language	English (US)
Pages (from-to)	851-863
Number of pages	13
Journal	Applied Optics
Volume	45
Issue number	5
DOIs	https://doi.org/10.1364/AO.45.000851
State	Published - Feb 10 2006
Externally published	Yes

ASJC Scopus subject areas

Engineering (miscellaneous)
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1364/AO.45.000851

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abstract = "We present a procedure that compensates for phase aberrations in digital holographic microscopy by computing a polynomial phase mask directly from the hologram. The phase-mask parameters are computed automatically without knowledge of physical values such as wave vectors, focal lengths, or distances. This method enables one to reconstruct correct and accurate phase distributions, even in the presence of strong and high-order aberrations. Examples of applications are shown for microlens imaging and for compensating for the deformations associated with a tilted thick plate. Finally we show that this method allows compensation for the curvature of the specimen, revealing its surface defects and roughness. Examples of applications are shown for microlenses and metallic sphere imaging.",

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T1 - Automatic procedure for aberration compensation in digital holographic microscopy and applications to specimen shape compensation

AU - Colomb, Tristan

AU - Cuche, Etienne

AU - Charrière, Florian

AU - Kühn, Jonas

AU - Aspert, Nicolas

AU - Montfort, Frédéric

AU - Marquet, Pierre

AU - Depeursinge, Christian

PY - 2006/2/10

Y1 - 2006/2/10

N2 - We present a procedure that compensates for phase aberrations in digital holographic microscopy by computing a polynomial phase mask directly from the hologram. The phase-mask parameters are computed automatically without knowledge of physical values such as wave vectors, focal lengths, or distances. This method enables one to reconstruct correct and accurate phase distributions, even in the presence of strong and high-order aberrations. Examples of applications are shown for microlens imaging and for compensating for the deformations associated with a tilted thick plate. Finally we show that this method allows compensation for the curvature of the specimen, revealing its surface defects and roughness. Examples of applications are shown for microlenses and metallic sphere imaging.

AB - We present a procedure that compensates for phase aberrations in digital holographic microscopy by computing a polynomial phase mask directly from the hologram. The phase-mask parameters are computed automatically without knowledge of physical values such as wave vectors, focal lengths, or distances. This method enables one to reconstruct correct and accurate phase distributions, even in the presence of strong and high-order aberrations. Examples of applications are shown for microlens imaging and for compensating for the deformations associated with a tilted thick plate. Finally we show that this method allows compensation for the curvature of the specimen, revealing its surface defects and roughness. Examples of applications are shown for microlenses and metallic sphere imaging.

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SN - 1559-128X

VL - 45

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EP - 863

JO - Applied Optics

JF - Applied Optics

IS - 5

ER -

Automatic procedure for aberration compensation in digital holographic microscopy and applications to specimen shape compensation

Abstract

ASJC Scopus subject areas

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