Bias-assisted H2 gas generation in HCl and KOH solutions using n-type GaN photoelectrode

Katsushi Fujii*, Kazuhiro Ohkawa

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

57 Scopus citations

Abstract

We studied H2 gas generation using a GaN photoelectrode in both HCl and KOH solutions. The photocurrent in KOH was larger than that in HCl under a small extra bias, and caused a more extensive H2 generation at the beginning. GaN corrosion in HCl was less extended than that in KOH during photoelectrochemical reactions. The stability of the GaN photoelectrode in HCl was a result of H2 O reduction and Cl- oxidation instead of water photoelectrolysis.

Original languageEnglish (US)
Pages (from-to)A468-A471
JournalJOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume153
Issue number3
DOIs
StatePublished - 2006
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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