Bias bffects in facirg targets sputtering on the structure and magnetic properties of NdFeMo thin films

Chang Qinq Sun; En Yong Jiang; Xi Xiang Zhang; Yu Guang Liu; Qi Lu

doi:10.1109/20.42296

Bias bffects in facirg targets sputtering on the structure and magnetic properties of NdFeMo thin films

Chang Qinq Sun, En Yong Jiang, Xi Xiang Zhang, Yu Guang Liu, Qi Lu

Research output: Contribution to journal › Article › peer-review

Abstract

Dc substrate biasing V_b is an important parameter for modulating the structure and magnetic properties of Facing Targets Sputtered (FTS) films. The effect of Vb is to promote diffusion and cause the resputtering of adatoms, and it also affects the deposition rate R and substrate temperature Ts.

Original language	English (US)
Pages (from-to)	3339-3340
Number of pages	2
Journal	IEEE Transactions on Magnetics
Volume	25
Issue number	5
DOIs	https://doi.org/10.1109/20.42296
State	Published - Sep 1989
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/20.42296

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title = "Bias bffects in facirg targets sputtering on the structure and magnetic properties of NdFeMo thin films",

abstract = "Dc substrate biasing Vb is an important parameter for modulating the structure and magnetic properties of Facing Targets Sputtered (FTS) films. The effect of Vb is to promote diffusion and cause the resputtering of adatoms, and it also affects the deposition rate R and substrate temperature Ts.",

author = "Sun, {Chang Qinq} and Jiang, {En Yong} and Zhang, {Xi Xiang} and Liu, {Yu Guang} and Qi Lu",

year = "1989",

month = sep,

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publisher = "Institute of Electrical and Electronics Engineers",

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T1 - Bias bffects in facirg targets sputtering on the structure and magnetic properties of NdFeMo thin films

AU - Sun, Chang Qinq

AU - Jiang, En Yong

AU - Zhang, Xi Xiang

AU - Liu, Yu Guang

AU - Lu, Qi

PY - 1989/9

Y1 - 1989/9

N2 - Dc substrate biasing Vb is an important parameter for modulating the structure and magnetic properties of Facing Targets Sputtered (FTS) films. The effect of Vb is to promote diffusion and cause the resputtering of adatoms, and it also affects the deposition rate R and substrate temperature Ts.

AB - Dc substrate biasing Vb is an important parameter for modulating the structure and magnetic properties of Facing Targets Sputtered (FTS) films. The effect of Vb is to promote diffusion and cause the resputtering of adatoms, and it also affects the deposition rate R and substrate temperature Ts.

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U2 - 10.1109/20.42296

DO - 10.1109/20.42296

M3 - Article

AN - SCOPUS:0024735330

SN - 0018-9464

VL - 25

SP - 3339

EP - 3340

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

IS - 5

ER -

Bias bffects in facirg targets sputtering on the structure and magnetic properties of NdFeMo thin films

Abstract

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