TY - JOUR
T1 - C-60 embedded diamond-like nanocomposite thin film
AU - Jana, Sukhendu
AU - Das, Sayan
AU - De, Debasish
AU - Shakti, Nanda
AU - Mondal, Anup
AU - Bhattacharya, Sekhar
AU - Gongopadhyay, Utpal
N1 - KAUST Repository Item: Exported on 2021-11-21
Acknowledgements: The authors most sincerely acknowledge the DST, Govt. of India for financing support and Meghnad Saha Institute of Technology for infrastructural support. The authors also acknowledge Prof. H. Saha and Prof. R.N. Bhattacharya for technical discussions.
PY - 2021/7/12
Y1 - 2021/7/12
N2 - Diamond-like nanocomposite (DLN) has become a promising thin film for many fields of applications due to its unique and tunable properties. However, low optical bandgap and thermal stability limits its application in many fields particularly as antireflection coating on solar cell. In the present study, the DLN thin film has been deposited using a mixed liquid precursor by rf-PECVD process. Surprisingly the presence of nc-C60 in FCC structure in DLN matrix has been observed. The degree of crystallinity and diameter of C60 have been increased significantly after annealed at 850 °C. The film has been annealed at 850 °C to primarily investigate its feasibility as antireflection coating (ARC) in compatible with industrial solar cell fabrication process. The refractive index and optical bandgap of the film were around 1.80 and 4.10 eV, respectively. Moreover, the optical bandgap has decreased to some extent to 3.92 eV even after annealing at such high temperature. The high SiOx at% and embedded nc-C60 enhanced the optical transparency and thermal stability of the DLN film. The solar-weighted average reflection of DLN-coated textured silicon was reduced significantly to 1.91%. The C60 embedded DLN film has a great potential to apply in different optoelectronic devices especially in solar cell as ARC.
AB - Diamond-like nanocomposite (DLN) has become a promising thin film for many fields of applications due to its unique and tunable properties. However, low optical bandgap and thermal stability limits its application in many fields particularly as antireflection coating on solar cell. In the present study, the DLN thin film has been deposited using a mixed liquid precursor by rf-PECVD process. Surprisingly the presence of nc-C60 in FCC structure in DLN matrix has been observed. The degree of crystallinity and diameter of C60 have been increased significantly after annealed at 850 °C. The film has been annealed at 850 °C to primarily investigate its feasibility as antireflection coating (ARC) in compatible with industrial solar cell fabrication process. The refractive index and optical bandgap of the film were around 1.80 and 4.10 eV, respectively. Moreover, the optical bandgap has decreased to some extent to 3.92 eV even after annealing at such high temperature. The high SiOx at% and embedded nc-C60 enhanced the optical transparency and thermal stability of the DLN film. The solar-weighted average reflection of DLN-coated textured silicon was reduced significantly to 1.91%. The C60 embedded DLN film has a great potential to apply in different optoelectronic devices especially in solar cell as ARC.
UR - http://hdl.handle.net/10754/670431
UR - https://link.springer.com/10.1007/s42823-021-00266-x
UR - http://www.scopus.com/inward/record.url?scp=85110930169&partnerID=8YFLogxK
U2 - 10.1007/s42823-021-00266-x
DO - 10.1007/s42823-021-00266-x
M3 - Article
SN - 2233-4998
JO - Carbon Letters
JF - Carbon Letters
ER -
