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Carbon-rich cyclopolymers: Their synthesis, etch resistance, and application to 193 nm microlithography
Dario Pasini*, Eric Low, Robert P. Meagley, Jean M.J. Frechet, C. Grant Willson, Jeffrey D. Byers
*Corresponding author for this work
Research output: Contribution to journal › Conference article › peer-review
5
Scopus
citations