Cathodoluminescence characterization of [112̄0]-oriented InGaN/GaN thin films grown on r-plane sapphire substrates by metalorganic vapor-phase epitaxy

K. Kusakabe*, T. Furuzuki, K. Ohkawa

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

We report the cathodoluminescence (CL) characterization of nonpolar [112̄ 20]-oriented InGaN/GaN thin films grown on r-plane sapphire substrates by atmospheric metalorganic vapor-phase epitaxy. The epitaxial GaN films grown on r-plane sapphire substrates frequently show facet surface morphology. The CL peak wavelength and local indium composition of InGaN grown on them were gradually varied with the probed position from the facet summit to valley. In a-plane InGaN, the facet summit was In-rich area while the valley was In-poor area. This is due to the material transport issue during epitaxial growth.

Original languageEnglish (US)
Pages (from-to)2544-2547
Number of pages4
JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
Volume4
Issue number7
DOIs
StatePublished - 2007
Externally publishedYes
EventInternational Workshop on Nitride Semiconductors, IWN 2006 - Kyoto, Japan
Duration: Oct 22 2006Oct 27 2006

ASJC Scopus subject areas

  • Condensed Matter Physics

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