Composition dependence of the work function of Ta1-xAl xNymetal gates

H. N. Alshareef*, K. Choi, H. C. Wen, H. Luan, H. Harris, Y. Senzaki, P. Majhi, B. H. Lee, R. Jammy, S. Aguirre-Tostado, B. E. Gnade, R. M. Wallace

*Corresponding author for this work

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