Contact behavior of focused ion beam deposited Pt on p-type Si nanowires

C. Y. Ho, S. H. Chiu, J. J. Ke, K. T. Tsai, Y. A. Dai, J. H. Hsu, M. L. Chang, J. H. He

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


Pt contact on p-Si nanowires (NWs) using Ga-ion-induced deposition by a focused ion beam was formed with a specific contact resistance (ρc) of 1.54 × 10- 6Ωcm2. Ohmic behavior is caused by Ga-ion-induced amorphization of Si NWs underneath the Pt contact. A very low Schottky barrier height associated with interface states raised from Pt-amorphized Si junction and with an image force induced by the applied bias can be implemented to elucidate ultralow ρc. The value of ρc lower than that of any known contact to Si NWs demonstrates a practical method for integrating NWs in devices and circuits.

Original languageEnglish (US)
Article number134008
Issue number13
StatePublished - 2010
Externally publishedYes

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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