Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes

Huang Chun Wen; Prashant Majhi; Kisik Choi; C. S. Park; Husam N. Alshareef; H. Rusty Harris; Hongfa Luan; Hiro Niimi; Hong Bae Park; Gennadi Bersuker; Patrick S. Lysaght; Dim Lee Kwong; S. C. Song; Byoung Hun Lee; Raj Jammy

doi:10.1016/j.mee.2007.05.006

Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes

Huang Chun Wen^*, Prashant Majhi, Kisik Choi, C. S. Park, Husam N. Alshareef, H. Rusty Harris, Hongfa Luan, Hiro Niimi, Hong Bae Park, Gennadi Bersuker, Patrick S. Lysaght, Dim Lee Kwong, S. C. Song, Byoung Hun Lee, Raj Jammy

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

48 Scopus citations

Abstract

A review of literature combined with recent experimental results addressing the intrinsic and extrinsic factors controlling the effective work function (EWF) of metal gate electrodes on Hf-based high-K dielectrics is discussed. Through a systematic study including accurate extraction of EWF, our observations suggest, unlike popularly perceived, intrinsic E_f-pinning does not limit the EWF tuning on high-K. Also, a critical issue challenging the maintenance of high EWF metals at low effective oxide thicknesses (EOT), due to a new phenomena described as the "V_fb roll-off", is reported for the first time.

Original language	English (US)
Pages (from-to)	2-8
Number of pages	7
Journal	Microelectronic Engineering
Volume	85
Issue number	1
DOIs	https://doi.org/10.1016/j.mee.2007.05.006
State	Published - Jan 2008
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2007.05.006

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Wen, H. C., Majhi, P., Choi, K., Park, C. S., Alshareef, H. N., Rusty Harris, H., Luan, H., Niimi, H., Park, H. B., Bersuker, G., Lysaght, P. S., Kwong, D. L., Song, S. C., Lee, B. H., & Jammy, R. (2008). Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes. Microelectronic Engineering, 85(1), 2-8. https://doi.org/10.1016/j.mee.2007.05.006

@article{b74b022050ab4e07855859ad8b39e2eb,

title = "Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes",

abstract = "A review of literature combined with recent experimental results addressing the intrinsic and extrinsic factors controlling the effective work function (EWF) of metal gate electrodes on Hf-based high-K dielectrics is discussed. Through a systematic study including accurate extraction of EWF, our observations suggest, unlike popularly perceived, intrinsic Ef-pinning does not limit the EWF tuning on high-K. Also, a critical issue challenging the maintenance of high EWF metals at low effective oxide thicknesses (EOT), due to a new phenomena described as the {"}Vfb roll-off{"}, is reported for the first time.",

author = "Wen, {Huang Chun} and Prashant Majhi and Kisik Choi and Park, {C. S.} and Alshareef, {Husam N.} and {Rusty Harris}, H. and Hongfa Luan and Hiro Niimi and Park, {Hong Bae} and Gennadi Bersuker and Lysaght, {Patrick S.} and Kwong, {Dim Lee} and Song, {S. C.} and Lee, {Byoung Hun} and Raj Jammy",

year = "2008",

month = jan,

doi = "10.1016/j.mee.2007.05.006",

language = "English (US)",

volume = "85",

pages = "2--8",

journal = "Microelectronic Engineering",

issn = "0167-9317",

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Wen, HC, Majhi, P, Choi, K, Park, CS, Alshareef, HN, Rusty Harris, H, Luan, H, Niimi, H, Park, HB, Bersuker, G, Lysaght, PS, Kwong, DL, Song, SC, Lee, BH & Jammy, R 2008, 'Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes', Microelectronic Engineering, vol. 85, no. 1, pp. 2-8. https://doi.org/10.1016/j.mee.2007.05.006

TY - JOUR

T1 - Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes

AU - Wen, Huang Chun

AU - Majhi, Prashant

AU - Choi, Kisik

AU - Park, C. S.

AU - Alshareef, Husam N.

AU - Rusty Harris, H.

AU - Luan, Hongfa

AU - Niimi, Hiro

AU - Park, Hong Bae

AU - Bersuker, Gennadi

AU - Lysaght, Patrick S.

AU - Kwong, Dim Lee

AU - Song, S. C.

AU - Lee, Byoung Hun

AU - Jammy, Raj

PY - 2008/1

Y1 - 2008/1

N2 - A review of literature combined with recent experimental results addressing the intrinsic and extrinsic factors controlling the effective work function (EWF) of metal gate electrodes on Hf-based high-K dielectrics is discussed. Through a systematic study including accurate extraction of EWF, our observations suggest, unlike popularly perceived, intrinsic Ef-pinning does not limit the EWF tuning on high-K. Also, a critical issue challenging the maintenance of high EWF metals at low effective oxide thicknesses (EOT), due to a new phenomena described as the "Vfb roll-off", is reported for the first time.

AB - A review of literature combined with recent experimental results addressing the intrinsic and extrinsic factors controlling the effective work function (EWF) of metal gate electrodes on Hf-based high-K dielectrics is discussed. Through a systematic study including accurate extraction of EWF, our observations suggest, unlike popularly perceived, intrinsic Ef-pinning does not limit the EWF tuning on high-K. Also, a critical issue challenging the maintenance of high EWF metals at low effective oxide thicknesses (EOT), due to a new phenomena described as the "Vfb roll-off", is reported for the first time.

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U2 - 10.1016/j.mee.2007.05.006

DO - 10.1016/j.mee.2007.05.006

M3 - Article

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SN - 0167-9317

VL - 85

SP - 2

EP - 8

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1

ER -

Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes

Abstract

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