Abstract
Recently, monolithic integration of III-IV quantum dots (QDs) on Si substrate has attracted much interest due to its potential to integrate photodetectors and lasers in silicon (Si) photonics [1], [2]. However, the device performance is often limited by the defects induced by the lattice mismatch between III-V materials and Si substrate. In this work, we report results of defect characterization on an InAs QD p-i-n photodetector epitaxially grown on Silicon. The device shows a very low dark current and low frequency noise spectroscopy (LFNS) characterizations were carried out to identify and quantify the deep level within the devices.
Original language | English (US) |
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Title of host publication | Device Research Conference - Conference Digest, DRC |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 165-166 |
Number of pages | 2 |
ISBN (Print) | 9781728121123 |
DOIs | |
State | Published - Jun 1 2019 |
Externally published | Yes |