Abstract
Several new dendrimers have been synthesized which contain acid thermally labile groups on their periphery. The tert-butyl ester and carbonate peripheral groups can be removed by an acid catalyzed thermolysis to drastically alter the solubility properties of the dendrimer, thus forming the basis for a two-tone chemically amplified resist material. A chemically amplified resist based on a dendritic polymer was demonstrated. This two-tone systems shows a high sensitivity towards both DUV and electron beam irradiation.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 142-143 |
| Number of pages | 2 |
| Journal | American Chemical Society, Polymer Preprints, Division of Polymer Chemistry |
| Volume | 41 |
| Issue number | 1 |
| State | Published - Mar 2000 |
| Externally published | Yes |
| Event | The San Francisco Meeting - San Francisco, CA, USA Duration: Mar 26 2000 → Mar 31 2000 |
ASJC Scopus subject areas
- Polymers and Plastics