Dendrimer-based self-assembled monolayers as resists for scanning probe lithography

David C. Tully; Kathryn Wilder; Jean M.J. Fréchet; Alexander R. Trimble; Calvin F. Quate

doi:10.1002/(SICI)1521-4095(199903)11:4<314::AID-ADMA314>3.0.CO;2-E

Dendrimer-based self-assembled monolayers as resists for scanning probe lithography

David C. Tully, Kathryn Wilder, Jean M.J. Fréchet, Alexander R. Trimble, Calvin F. Quate

Research output: Contribution to journal › Article › peer-review

109 Scopus citations

Abstract

Monolayers of dendritic polymers were prepared by covalent attachment to a silicon wafer surface. Field enhanced oxidation of the monolayers was performed on a silicon surface using scanning probe lithography (SPL) to create features with dimensions below 60 nm. The dendrimer films were found to be resistant to a wet HF etch, thus, allowed to produce a positive-tone image as the patterned oxide itself relief features are etched away.

Original language	English (US)
Pages (from-to)	314-318
Number of pages	5
Journal	Advanced Materials
Volume	11
Issue number	4
DOIs	https://doi.org/10.1002/(SICI)1521-4095(199903)11:4<314::AID-ADMA314>3.0.CO;2-E
State	Published - 1999
Externally published	Yes

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/(SICI)1521-4095(199903)11:4<314::AID-ADMA314>3.0.CO;2-E

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abstract = "Monolayers of dendritic polymers were prepared by covalent attachment to a silicon wafer surface. Field enhanced oxidation of the monolayers was performed on a silicon surface using scanning probe lithography (SPL) to create features with dimensions below 60 nm. The dendrimer films were found to be resistant to a wet HF etch, thus, allowed to produce a positive-tone image as the patterned oxide itself relief features are etched away.",

author = "Tully, {David C.} and Kathryn Wilder and Fr{\'e}chet, {Jean M.J.} and Trimble, {Alexander R.} and Quate, {Calvin F.}",

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AU - Tully, David C.

AU - Wilder, Kathryn

AU - Fréchet, Jean M.J.

AU - Trimble, Alexander R.

AU - Quate, Calvin F.

PY - 1999

Y1 - 1999

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AB - Monolayers of dendritic polymers were prepared by covalent attachment to a silicon wafer surface. Field enhanced oxidation of the monolayers was performed on a silicon surface using scanning probe lithography (SPL) to create features with dimensions below 60 nm. The dendrimer films were found to be resistant to a wet HF etch, thus, allowed to produce a positive-tone image as the patterned oxide itself relief features are etched away.

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DO - 10.1002/(SICI)1521-4095(199903)11:4<314::AID-ADMA314>3.0.CO;2-E

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Dendrimer-based self-assembled monolayers as resists for scanning probe lithography

Abstract

ASJC Scopus subject areas

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