Design of photoresists with reduced environmental impact. 1. Water-soluble resists based on photo-cross-linking of poly(vinyl alcohol)

Jennifer M. Havard, Sang Yeon Shim, Jean M.J. Fréchet*, Qinghuang Lin, David R. Medeiros, C. Grant Willson, Jeffrey D. Byers

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

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Chemistry

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Material Science