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Development of a fast and high resolution e-beam process for the fabrication of X-ray masks with CD of 0.15 μm
I. Raptis*, M. Gentili, E. Di Fabrizio, R. Maggiora, M. Baciocchi, L. Grella, L. Mastrogiacomo
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
4
Scopus
citations