Development of a laser holographic interference lithography system

Oki Gunawan; Lui Whye Hoe; Boon Siew Ooi; Yuen Chuen Chan; Yee Loy Lam; Yan Zhou

doi:10.1117/12.370356

Development of a laser holographic interference lithography system

Oki Gunawan^*, Lui Whye Hoe, Boon Siew Ooi, Yuen Chuen Chan, Yee Loy Lam, Yan Zhou

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

Fabrication of periodic grating is very important for photonic devices such as Distributed Feedback (DFB) lasers, optical fiber Bragg grating based devices and optical couplers. Here, we report the development of holographic grating techniques utilizing a rotary mirror holder for grating period from 10 μm to 0.5 μm and Fresnel bimirrors for period greater than 1 μm. These holographic technique offers a wide range of tunability, good resolution, relatively simple apparatus, high uniformity and large-coverage of pattern area. A single line HeCd laser was used in these set up. The grating patterns have been successfully transfer onto GaAs substrate after dry etching with photoresist as mask. In addition, with the insertion of orthogonal Fresnel bimirror in the system, square grating patterns have been successfully obtained with grating period of 2 μm × 2 μm.

Original language	English (US)
Pages (from-to)	515-522
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3896
DOIs	https://doi.org/10.1117/12.370356
State	Published - 1999
Externally published	Yes
Event	Proceedings of the 1999 Design, Fabrication, and Characterization of Photonic Devices - Singapore, Singapore Duration: Nov 30 1999 → Dec 3 1999

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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title = "Development of a laser holographic interference lithography system",

abstract = "Fabrication of periodic grating is very important for photonic devices such as Distributed Feedback (DFB) lasers, optical fiber Bragg grating based devices and optical couplers. Here, we report the development of holographic grating techniques utilizing a rotary mirror holder for grating period from 10 μm to 0.5 μm and Fresnel bimirrors for period greater than 1 μm. These holographic technique offers a wide range of tunability, good resolution, relatively simple apparatus, high uniformity and large-coverage of pattern area. A single line HeCd laser was used in these set up. The grating patterns have been successfully transfer onto GaAs substrate after dry etching with photoresist as mask. In addition, with the insertion of orthogonal Fresnel bimirror in the system, square grating patterns have been successfully obtained with grating period of 2 μm × 2 μm.",

author = "Oki Gunawan and Hoe, {Lui Whye} and Ooi, {Boon Siew} and Chan, {Yuen Chuen} and Lam, {Yee Loy} and Yan Zhou",

year = "1999",

doi = "10.1117/12.370356",

language = "English (US)",

volume = "3896",

pages = "515--522",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Proceedings of the 1999 Design, Fabrication, and Characterization of Photonic Devices ; Conference date: 30-11-1999 Through 03-12-1999",

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TY - JOUR

T1 - Development of a laser holographic interference lithography system

AU - Gunawan, Oki

AU - Hoe, Lui Whye

AU - Ooi, Boon Siew

AU - Chan, Yuen Chuen

AU - Lam, Yee Loy

AU - Zhou, Yan

PY - 1999

Y1 - 1999

N2 - Fabrication of periodic grating is very important for photonic devices such as Distributed Feedback (DFB) lasers, optical fiber Bragg grating based devices and optical couplers. Here, we report the development of holographic grating techniques utilizing a rotary mirror holder for grating period from 10 μm to 0.5 μm and Fresnel bimirrors for period greater than 1 μm. These holographic technique offers a wide range of tunability, good resolution, relatively simple apparatus, high uniformity and large-coverage of pattern area. A single line HeCd laser was used in these set up. The grating patterns have been successfully transfer onto GaAs substrate after dry etching with photoresist as mask. In addition, with the insertion of orthogonal Fresnel bimirror in the system, square grating patterns have been successfully obtained with grating period of 2 μm × 2 μm.

AB - Fabrication of periodic grating is very important for photonic devices such as Distributed Feedback (DFB) lasers, optical fiber Bragg grating based devices and optical couplers. Here, we report the development of holographic grating techniques utilizing a rotary mirror holder for grating period from 10 μm to 0.5 μm and Fresnel bimirrors for period greater than 1 μm. These holographic technique offers a wide range of tunability, good resolution, relatively simple apparatus, high uniformity and large-coverage of pattern area. A single line HeCd laser was used in these set up. The grating patterns have been successfully transfer onto GaAs substrate after dry etching with photoresist as mask. In addition, with the insertion of orthogonal Fresnel bimirror in the system, square grating patterns have been successfully obtained with grating period of 2 μm × 2 μm.

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DO - 10.1117/12.370356

M3 - Conference article

AN - SCOPUS:0033351991

SN - 0277-786X

VL - 3896

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EP - 522

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1999 Design, Fabrication, and Characterization of Photonic Devices

Y2 - 30 November 1999 through 3 December 1999

ER -

Development of a laser holographic interference lithography system

Abstract

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