Development of a laser holographic interference lithography system

Oki Gunawan*, Lui Whye Hoe, Boon Siew Ooi, Yuen Chuen Chan, Yee Loy Lam, Yan Zhou

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations


Fabrication of periodic grating is very important for photonic devices such as Distributed Feedback (DFB) lasers, optical fiber Bragg grating based devices and optical couplers. Here, we report the development of holographic grating techniques utilizing a rotary mirror holder for grating period from 10 μm to 0.5 μm and Fresnel bimirrors for period greater than 1 μm. These holographic technique offers a wide range of tunability, good resolution, relatively simple apparatus, high uniformity and large-coverage of pattern area. A single line HeCd laser was used in these set up. The grating patterns have been successfully transfer onto GaAs substrate after dry etching with photoresist as mask. In addition, with the insertion of orthogonal Fresnel bimirror in the system, square grating patterns have been successfully obtained with grating period of 2 μm × 2 μm.

Original languageEnglish (US)
Pages (from-to)515-522
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1999
Externally publishedYes
EventProceedings of the 1999 Design, Fabrication, and Characterization of Photonic Devices - Singapore, Singapore
Duration: Nov 30 1999Dec 3 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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