Dewetting of resist/metal bilayers in resist stripping processes

Yihong Wu*, Peiwen Qiao, Towchong Chong, Teck Seng Low, Hong Xie, Ping Luo, Zaibing Guo, Jinjun Qiu

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    2 Scopus citations


    We report the observations of dewetting of resist/metal bilayers in a resist stripping process of nanofabrication in O 2 plasma. The initiation of the dewetting process is tentatively associated with local heating caused by surface plasmon induced in metallic nanoparticles or nanowires. The surface patterns thus formed differ substantially from all the dewetting patterns reported so far, and they resemble trees at micrometer scale. The possible mechanism for the formation of this kind striking patterns is discussed and its implication to future nanoelectronics manufacturing is addressed.

    Original languageEnglish (US)
    Pages (from-to)3361-3363
    Number of pages3
    JournalApplied Physics Letters
    Issue number21
    StatePublished - May 21 2001

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)


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