Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Peng Chen; Haojun Liang; Ru Xia; Jiasheng Qian; Xiaoshuang Feng

doi:10.1021/ma301203a

Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Peng Chen^*, Haojun Liang, Ru Xia, Jiasheng Qian, Xiaoshuang Feng

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

Using real-space self-consistent field theory calculations (SCFT), directed self-assembly of block copolymers was explored on sparsely nanopatterned substrates. In this study, the lamellar structure forming block copolymers are confined between two surfaces. The top surface is strictly neutral, and the bottom one is periodically patterned with neutral interspacing (nanopattern), which forms a sparsely nanopatterned substrate. The dimension of nanopatterns is commensurate with periods of lamellar structure of the block copolymers self-assembling in bulk. By systematically varying the film thickness and interspacing between nanopatterns, the density multiplication of nanopattern in the film was investigated, and a variety of nanostructures not available in bulk (nonbulk structures) were observed.

Original language	English (US)
Pages (from-to)	922-926
Number of pages	5
Journal	Macromolecules
Volume	46
Issue number	3
DOIs	https://doi.org/10.1021/ma301203a
State	Published - Feb 12 2013
Externally published	Yes

ASJC Scopus subject areas

Materials Chemistry
Polymers and Plastics
Inorganic Chemistry
Organic Chemistry

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@article{3a0c6efed1a64b72b7c7996ac78f6270,

title = "Directed self-assembly of block copolymers on sparsely nanopatterned substrates",

abstract = "Using real-space self-consistent field theory calculations (SCFT), directed self-assembly of block copolymers was explored on sparsely nanopatterned substrates. In this study, the lamellar structure forming block copolymers are confined between two surfaces. The top surface is strictly neutral, and the bottom one is periodically patterned with neutral interspacing (nanopattern), which forms a sparsely nanopatterned substrate. The dimension of nanopatterns is commensurate with periods of lamellar structure of the block copolymers self-assembling in bulk. By systematically varying the film thickness and interspacing between nanopatterns, the density multiplication of nanopattern in the film was investigated, and a variety of nanostructures not available in bulk (nonbulk structures) were observed.",

author = "Peng Chen and Haojun Liang and Ru Xia and Jiasheng Qian and Xiaoshuang Feng",

year = "2013",

month = feb,

day = "12",

doi = "10.1021/ma301203a",

language = "English (US)",

volume = "46",

pages = "922--926",

journal = "Macromolecules",

issn = "0024-9297",

publisher = "American Chemical Society",

number = "3",

}

TY - JOUR

T1 - Directed self-assembly of block copolymers on sparsely nanopatterned substrates

AU - Chen, Peng

AU - Liang, Haojun

AU - Xia, Ru

AU - Qian, Jiasheng

AU - Feng, Xiaoshuang

PY - 2013/2/12

Y1 - 2013/2/12

N2 - Using real-space self-consistent field theory calculations (SCFT), directed self-assembly of block copolymers was explored on sparsely nanopatterned substrates. In this study, the lamellar structure forming block copolymers are confined between two surfaces. The top surface is strictly neutral, and the bottom one is periodically patterned with neutral interspacing (nanopattern), which forms a sparsely nanopatterned substrate. The dimension of nanopatterns is commensurate with periods of lamellar structure of the block copolymers self-assembling in bulk. By systematically varying the film thickness and interspacing between nanopatterns, the density multiplication of nanopattern in the film was investigated, and a variety of nanostructures not available in bulk (nonbulk structures) were observed.

AB - Using real-space self-consistent field theory calculations (SCFT), directed self-assembly of block copolymers was explored on sparsely nanopatterned substrates. In this study, the lamellar structure forming block copolymers are confined between two surfaces. The top surface is strictly neutral, and the bottom one is periodically patterned with neutral interspacing (nanopattern), which forms a sparsely nanopatterned substrate. The dimension of nanopatterns is commensurate with periods of lamellar structure of the block copolymers self-assembling in bulk. By systematically varying the film thickness and interspacing between nanopatterns, the density multiplication of nanopattern in the film was investigated, and a variety of nanostructures not available in bulk (nonbulk structures) were observed.

UR - http://www.scopus.com/inward/record.url?scp=84873617748&partnerID=8YFLogxK

U2 - 10.1021/ma301203a

DO - 10.1021/ma301203a

M3 - Article

AN - SCOPUS:84873617748

SN - 0024-9297

VL - 46

SP - 922

EP - 926

JO - Macromolecules

JF - Macromolecules

IS - 3

ER -

Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Abstract

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