TY - JOUR
T1 - Dual-Function Electron-Conductive, Hole-Blocking Titanium Nitride Contacts for Efficient Silicon Solar Cells
AU - Yang, Xinbo
AU - Liu, Wenzhu
AU - de Bastiani, Michele
AU - Allen, Thomas
AU - Kang, Jingxuan
AU - Xu, Hang
AU - Aydin, Erkan
AU - Xu, Lujia
AU - Bi, Qunyu
AU - Dang, Hoang
AU - AlHabshi, Esra
AU - Kotsovos, Konstantinos
AU - AlSaggaf, Ahmed
AU - Gereige, Issam
AU - Wan, Yimao
AU - Peng, Jun
AU - Samundsett, Christian
AU - Cuevas, Andres
AU - De Wolf, Stefaan
N1 - KAUST Repository Item: Exported on 2020-10-01
Acknowledged KAUST grant number(s): OSR-CRG URF/1/3383
Acknowledgements: The research reported in this publication was supported by funding from King Abdullah University of Science and Technology (KAUST) Office of Sponsored Research (OSR) under award no. OSR-CRG URF/1/3383, as well as funding from Saudi Aramco.
PY - 2019/4/16
Y1 - 2019/4/16
N2 - High-performance passivating contact is a prerequisite for high-efficiency crystalline silicon (c-Si) solar cells. In this work, an electron-conductive, hole-blocking contact based on titanium nitride (TiN) deposited by reactive magnetron sputtering is presented. Quasi-metallic TiN combined with an ultrathin SiO2 passivation layer (SiO2/TiN) is demonstrated to be an effective electron-selective contact on c-Si, featuring a low-contact resistivity of 16.4 mΩ.cm2 and a tolerable recombination current parameter of ∼500 fA/cm2. By implementing the dual-function SiO2/TiN contact, which acts simultaneously as a surface passivating layer and metal electrode, an efficiency of 20% is achieved by an n-type c-Si solar cell with a simple structure. This work not only demonstrates a way to develop efficient n-type c-Si solar cells with dual-function metal nitride contacts at a low cost but also expands the pool of available carrier transport materials, from metal oxides to metal nitrides, for photovoltaic devices.
AB - High-performance passivating contact is a prerequisite for high-efficiency crystalline silicon (c-Si) solar cells. In this work, an electron-conductive, hole-blocking contact based on titanium nitride (TiN) deposited by reactive magnetron sputtering is presented. Quasi-metallic TiN combined with an ultrathin SiO2 passivation layer (SiO2/TiN) is demonstrated to be an effective electron-selective contact on c-Si, featuring a low-contact resistivity of 16.4 mΩ.cm2 and a tolerable recombination current parameter of ∼500 fA/cm2. By implementing the dual-function SiO2/TiN contact, which acts simultaneously as a surface passivating layer and metal electrode, an efficiency of 20% is achieved by an n-type c-Si solar cell with a simple structure. This work not only demonstrates a way to develop efficient n-type c-Si solar cells with dual-function metal nitride contacts at a low cost but also expands the pool of available carrier transport materials, from metal oxides to metal nitrides, for photovoltaic devices.
UR - http://hdl.handle.net/10754/631972
UR - https://www.sciencedirect.com/science/article/pii/S2542435119301023
UR - http://www.scopus.com/inward/record.url?scp=85065490824&partnerID=8YFLogxK
U2 - 10.1016/j.joule.2019.03.008
DO - 10.1016/j.joule.2019.03.008
M3 - Article
SN - 2542-4351
VL - 3
SP - 1314
EP - 1327
JO - Joule
JF - Joule
IS - 5
ER -