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Dive into the research topics of 'Effects of ALD TiN metal gate thickness on metal gate /high-k dielectric SOI FinFET characteristics'. Together they form a unique fingerprint.- Sort by
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C. Y. Kang, R. Choi, S. C. Song, B. S. Ju, Muhammad Mustafa Hussain, B. H. Lee, J. W. Yang, P. Zeitzoff, D. Pham, W. Xiong, H. H. Tseng
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review