Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

D. J. Yang; Q. Zhang; S. F. Yoon; J. Ahn; S. G. Wang; Q. Zhou; Q. Wang; J. Q. Li

doi:10.1016/S0257-8972(02)00921-0

Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

D. J. Yang^*, Q. Zhang, S. F. Yoon, J. Ahn, S. G. Wang, Q. Zhou, Q. Wang, J. Q. Li

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

In this paper, we studied the effects of oxygen (O₂) and nitrogen (N₂) on the growth of carbon nanotubes (CNTs) prepared using microwave plasma-enhanced chemical vapor deposition (MPECVD). CNTs were prepared with 20-100-nm-sized Ni catalyst grains under three different groups of plasma conditions. Scanning electron microscopy (SEM) results show that the quality of CNTs is improved and number density greatly increased with addition of N₂ and O ₂ in the process. The morphology and Ni composition strongly suggest that the grain size and composition of the Ni catalyst can be modified by the N₂ and O₂ plasma pretreatments. A nitride-enhanced growth mechanism is also discussed.

Original language	English (US)
Pages (from-to)	288-291
Number of pages	4
Journal	Surface and Coatings Technology
Volume	167
Issue number	2-3
DOIs	https://doi.org/10.1016/S0257-8972(02)00921-0
State	Published - Apr 22 2003
Externally published	Yes

Keywords

Carbon nanotubes
Microwave plasma-enhanced chemical vapor deposition (MPECVD)
Nitrogen
Oxygen

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/S0257-8972(02)00921-0

Cite this

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title = "Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique",

abstract = "In this paper, we studied the effects of oxygen (O2) and nitrogen (N2) on the growth of carbon nanotubes (CNTs) prepared using microwave plasma-enhanced chemical vapor deposition (MPECVD). CNTs were prepared with 20-100-nm-sized Ni catalyst grains under three different groups of plasma conditions. Scanning electron microscopy (SEM) results show that the quality of CNTs is improved and number density greatly increased with addition of N2 and O 2 in the process. The morphology and Ni composition strongly suggest that the grain size and composition of the Ni catalyst can be modified by the N2 and O2 plasma pretreatments. A nitride-enhanced growth mechanism is also discussed.",

keywords = "Carbon nanotubes, Microwave plasma-enhanced chemical vapor deposition (MPECVD), Nitrogen, Oxygen",

author = "Yang, {D. J.} and Q. Zhang and Yoon, {S. F.} and J. Ahn and Wang, {S. G.} and Q. Zhou and Q. Wang and Li, {J. Q.}",

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doi = "10.1016/S0257-8972(02)00921-0",

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TY - JOUR

T1 - Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

AU - Yang, D. J.

AU - Zhang, Q.

AU - Yoon, S. F.

AU - Ahn, J.

AU - Wang, S. G.

AU - Zhou, Q.

AU - Wang, Q.

AU - Li, J. Q.

PY - 2003/4/22

Y1 - 2003/4/22

N2 - In this paper, we studied the effects of oxygen (O2) and nitrogen (N2) on the growth of carbon nanotubes (CNTs) prepared using microwave plasma-enhanced chemical vapor deposition (MPECVD). CNTs were prepared with 20-100-nm-sized Ni catalyst grains under three different groups of plasma conditions. Scanning electron microscopy (SEM) results show that the quality of CNTs is improved and number density greatly increased with addition of N2 and O 2 in the process. The morphology and Ni composition strongly suggest that the grain size and composition of the Ni catalyst can be modified by the N2 and O2 plasma pretreatments. A nitride-enhanced growth mechanism is also discussed.

AB - In this paper, we studied the effects of oxygen (O2) and nitrogen (N2) on the growth of carbon nanotubes (CNTs) prepared using microwave plasma-enhanced chemical vapor deposition (MPECVD). CNTs were prepared with 20-100-nm-sized Ni catalyst grains under three different groups of plasma conditions. Scanning electron microscopy (SEM) results show that the quality of CNTs is improved and number density greatly increased with addition of N2 and O 2 in the process. The morphology and Ni composition strongly suggest that the grain size and composition of the Ni catalyst can be modified by the N2 and O2 plasma pretreatments. A nitride-enhanced growth mechanism is also discussed.

KW - Carbon nanotubes

KW - Microwave plasma-enhanced chemical vapor deposition (MPECVD)

KW - Nitrogen

KW - Oxygen

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U2 - 10.1016/S0257-8972(02)00921-0

DO - 10.1016/S0257-8972(02)00921-0

M3 - Article

AN - SCOPUS:0037461189

SN - 0257-8972

VL - 167

SP - 288

EP - 291

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 2-3

ER -

Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

Abstract

Keywords

ASJC Scopus subject areas

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