Abstract
We demonstrate high-power edge-emitting laser diodes (LDs) with tunnel junction contacts grown by molecular beam epitaxy (MBE). Under pulsed conditions, lower threshold current densities were observed from LDs with MBE-grown tunnel junctions than from similarly fabricated control LDs with ITO contacts. LDs with tunnel junction contacts grown by metal-organic chemical vapor deposition (MOCVD) were additionally demonstrated. These LDs were fabricated using a p-GaN activation scheme utilizing lateral diffusion of hydrogen through the LD ridge sidewalls. Secondary ion mass spectroscopy measurements of the [Si] and [Mg] profiles in the MBE-grown and MOCVD-grown tunnel junctions were conducted to further investigate the results.
Original language | English (US) |
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Pages (from-to) | 8327-8334 |
Number of pages | 8 |
Journal | OPTICS EXPRESS |
Volume | 27 |
Issue number | 6 |
DOIs | |
State | Published - Mar 18 2019 |
Externally published | Yes |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics