Electron-beam lithography patterning of magnetic nickel films

A. Gerardino, E. Di Fabrizio, A. Nottola, S. Cabrini, G. Giannini, L. Mastrogiacomo, G. Gubbiotti, P. Candeloro, G. Carlotti

Research output: Contribution to journalArticlepeer-review

10 Scopus citations


Electron beam (e-beam) lithography has been used to fabricate arrays of rectangular and triangular shaped nickel dots. Dot dimensions range from 250 nm to 1 μm with separations of sub 100, 100 and 250 nm. The array dimensions are about 1 mm2. X-ray masks to perform the dot patterning by X-ray lithography have been fabricated too. The whole lithographic process is described together with preliminary results concerning the magnetic characterisation of the patterned structures.

Original languageEnglish (US)
Pages (from-to)931-937
Number of pages7
JournalMicroelectronic Engineering
StatePublished - Sep 2001
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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