Electron cyclotron resonance plasma etching of InP through-wafer connections at >4 μm/min using Cl2/Ar

Y. W. Chen*, B. S. Ooi, G. I. Ng, C. L. Tan

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

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Keyphrases

Physics

Material Science