@inproceedings{e2f3200825494b3794138f845f48c310,
title = "Electrostatically tunable nanomechanical shallow arches",
abstract = "We report an analytical and experimental study on the tunability of in-plane doubly-clamped nanomechanical arches under varied DC bias conditions at room temperature. For this purpose, silicon based shallow arches are fabricated using standard e-beam lithography and surface nanomachining of a highly conductive device layer on a silicon-on-insulator (SOI) wafer. The experimental results show good agreement with the analytical results with a maximum tunability of 108.14% for 180 nm thick arch with a transduction gap of 1 μm between the beam and the driving/sensing electrodes. The high tunability of shallow arches paves the ways for highly tunable band pass filtering applications in high frequency range.",
author = "Kazmi, {Syed N.R.} and Hajjaj, {Amal Z.} and Costa, {Pedro M.F.J.} and Younis, {Mohammad I.}",
note = "Publisher Copyright: {\textcopyright} Copyright 2017 ASME.; ASME 2017 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference, IDETC/CIE 2017 ; Conference date: 06-08-2017 Through 09-08-2017",
year = "2017",
doi = "10.1115/DETC2017-67845",
language = "English (US)",
series = "Proceedings of the ASME Design Engineering Technical Conference",
publisher = "American Society of Mechanical Engineers (ASME)",
booktitle = "22nd Design for Manufacturing and the Life Cycle Conference; 11th International Conference on Micro- and Nanosystems",
}