Abstract
We investigated the effect of a combined AlN/Al0.03Ga0.97N barrier on InGaN-based amber light-emitting diodes (LEDs) grown by metalorganic vapor-phase epitaxy. InGaN-based multiple quantum wells with a combined AlN/Al0.03Ga0.97N barrier showed intense photoluminescence with a narrow full-width at half-maximum. The amber LEDs with a combined AlN/Al0.03Ga0.97N barrier achieved a light output power enhanced approximately 2.5-fold at 20 mA compared to that of the LED with a combined AlN/GaN barrier, owing to the reduction of defects in InGaN active layers. Thus, the efficiency of high-In-content InGaN-based LEDs can be improved in the spectrum range of amber.
Original language | English (US) |
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Pages (from-to) | 105-108 |
Number of pages | 4 |
Journal | Journal of Crystal Growth |
Volume | 448 |
DOIs | |
State | Published - Aug 15 2016 |
Externally published | Yes |
ASJC Scopus subject areas
- Materials Chemistry
- Inorganic Chemistry
- Condensed Matter Physics