Epitaxial single crystal Fe16N2 films grown by facing targets sputtering

D. C. Sun*, E. Y. Jiang, M. B. Tian, C. Lin, X. X. Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

45 Scopus citations


α″-Fe16N2 single crystal films can be prepared successfully by facing targets sputtering directly onto NaCl(100) substrates in a mixture of argon and nitrogen gases. Both x-ray diffractometer and transmission electron microscope are employed to characterize the crystal structure of the films. The perfect electron diffraction patterns of α″-Fe16N2 single crystal in [111], [011], and [001] directions can be distinctly observed by double tilting. These patterns confirm that the crystal structure of the films corresponds to a body-centered tetragonal (bct) lattice with the parameters of a=b=5.72 Å and c=6.29 Å . The x-ray diffraction patterns show that α″-Fe16N2 epitaxially grows on the NaCl(100) substrate with an orientation relationship α″-Fe16N2(001)∥NaCl(001) and α″-Fe16N2[100]∥NaCl[100]. The saturation magnetization of the Fe16N2 films is around 2100-2300 emu/cc, which agrees well with the value reported by Sugita et al..

Original languageEnglish (US)
Pages (from-to)5440-5442
Number of pages3
JournalJournal of Applied Physics
Issue number8 PART 2A
StatePublished - Apr 15 1996
Externally publishedYes

ASJC Scopus subject areas

  • General Physics and Astronomy


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