Erosion resistance of polycrystalline diamond films to atomic oxygen

Jingqi Li; Qing Zhang; S. F. Yoon; J. Ahn; Qiang Zhou; Sigen Wang; Dajiang Yang; Qiang Wang

doi:10.1016/S0008-6223(03)00176-3

Erosion resistance of polycrystalline diamond films to atomic oxygen

Jingqi Li^*, Qing Zhang, S. F. Yoon, J. Ahn, Qiang Zhou, Sigen Wang, Dajiang Yang, Qiang Wang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

Polycrystalline diamond films deposited using hot filament chemical vapor deposition (CVD) technique have been investigated in atomic oxygen simulated as low earth orbit environment to examine their erosion resistance properties. After exposure to the atomic oxygen beam with a flux of 2.6×10¹⁶ atoms/cm² s, the diamond films only show a small mass loss. The reaction efficiency is estimated to be between 6.35×10^-26 and 8.28×10^-26 cm³/atom. Oxidation mechanism is investigated through the reaction temperature influence on the reaction rate. We suggest that atomic oxygen reacts with diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations besides eroding the surface.

Original language	English (US)
Pages (from-to)	1847-1850
Number of pages	4
Journal	Carbon
Volume	41
Issue number	9
DOIs	https://doi.org/10.1016/S0008-6223(03)00176-3
State	Published - Jun 27 2003

Keywords

A. Diamond
B. Oxidation
C. Surface oxygen complex
D. Reactivity

ASJC Scopus subject areas

Chemistry(all)

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10.1016/S0008-6223(03)00176-3

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title = "Erosion resistance of polycrystalline diamond films to atomic oxygen",

abstract = "Polycrystalline diamond films deposited using hot filament chemical vapor deposition (CVD) technique have been investigated in atomic oxygen simulated as low earth orbit environment to examine their erosion resistance properties. After exposure to the atomic oxygen beam with a flux of 2.6×1016 atoms/cm2 s, the diamond films only show a small mass loss. The reaction efficiency is estimated to be between 6.35×10-26 and 8.28×10-26 cm3/atom. Oxidation mechanism is investigated through the reaction temperature influence on the reaction rate. We suggest that atomic oxygen reacts with diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations besides eroding the surface.",

keywords = "A. Diamond, B. Oxidation, C. Surface oxygen complex, D. Reactivity",

author = "Jingqi Li and Qing Zhang and Yoon, {S. F.} and J. Ahn and Qiang Zhou and Sigen Wang and Dajiang Yang and Qiang Wang",

year = "2003",

month = jun,

day = "27",

doi = "10.1016/S0008-6223(03)00176-3",

language = "English (US)",

volume = "41",

pages = "1847--1850",

journal = "Carbon",

issn = "0008-6223",

publisher = "Elsevier",

number = "9",

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TY - JOUR

T1 - Erosion resistance of polycrystalline diamond films to atomic oxygen

AU - Li, Jingqi

AU - Zhang, Qing

AU - Yoon, S. F.

AU - Ahn, J.

AU - Zhou, Qiang

AU - Wang, Sigen

AU - Yang, Dajiang

AU - Wang, Qiang

PY - 2003/6/27

Y1 - 2003/6/27

N2 - Polycrystalline diamond films deposited using hot filament chemical vapor deposition (CVD) technique have been investigated in atomic oxygen simulated as low earth orbit environment to examine their erosion resistance properties. After exposure to the atomic oxygen beam with a flux of 2.6×1016 atoms/cm2 s, the diamond films only show a small mass loss. The reaction efficiency is estimated to be between 6.35×10-26 and 8.28×10-26 cm3/atom. Oxidation mechanism is investigated through the reaction temperature influence on the reaction rate. We suggest that atomic oxygen reacts with diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations besides eroding the surface.

AB - Polycrystalline diamond films deposited using hot filament chemical vapor deposition (CVD) technique have been investigated in atomic oxygen simulated as low earth orbit environment to examine their erosion resistance properties. After exposure to the atomic oxygen beam with a flux of 2.6×1016 atoms/cm2 s, the diamond films only show a small mass loss. The reaction efficiency is estimated to be between 6.35×10-26 and 8.28×10-26 cm3/atom. Oxidation mechanism is investigated through the reaction temperature influence on the reaction rate. We suggest that atomic oxygen reacts with diamond surface and forms ether (C-O-C) and carbonyl (>C=O) configurations besides eroding the surface.

KW - A. Diamond

KW - B. Oxidation

KW - C. Surface oxygen complex

KW - D. Reactivity

UR - http://www.scopus.com/inward/record.url?scp=0038043427&partnerID=8YFLogxK

U2 - 10.1016/S0008-6223(03)00176-3

DO - 10.1016/S0008-6223(03)00176-3

M3 - Article

AN - SCOPUS:0038043427

SN - 0008-6223

VL - 41

SP - 1847

EP - 1850

JO - Carbon

JF - Carbon

IS - 9

ER -

Erosion resistance of polycrystalline diamond films to atomic oxygen

Abstract

Keywords

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