Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy

Scott A. Backer; Itai Suez; Zachary M. Fresco; Jean M.J. Fŕchet; Josh A. Conway; Shantha Vedantam; Hyojune Lee; Eli Yablonovitch

doi:10.1116/1.2757184

Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy

Scott A. Backer^*, Itai Suez, Zachary M. Fresco, Jean M.J. Fŕchet, Josh A. Conway, Shantha Vedantam, Hyojune Lee, Eli Yablonovitch

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

A new resist formulation was successfully patterned using near field optical microscopy in order to simulate the conditions prevailing in silver based plasmonic imaging tools. Radiation at 476 nm was transmitted through a near field scanning optical microscopy fiber probe tip to cross-link a film of poly(4-methacrylmethyl styrene) via polymerization of pendant methacryloyl groups using camphorquinone and dimethyl aniline as an initiating system. Patterns were generated by scanning at several speeds in order to moderate the dose while maintaining a constant probe height of about 5 nm above the sample through shear force feedback. After development, lines corresponding to the exposed regions were observed. At a scanning speed of 4 μms, the observed pattern has a full width at half maximum of 275 nm and a height of ∼25 nm.

Original language	English (US)
Pages (from-to)	1336-1339
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	25
Issue number	4
DOIs	https://doi.org/10.1116/1.2757184
State	Published - 2007
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2757184

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Backer, S. A., Suez, I., Fresco, Z. M., Fŕchet, J. M. J., Conway, J. A., Vedantam, S., Lee, H., & Yablonovitch, E. (2007). Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 25(4), 1336-1339. https://doi.org/10.1116/1.2757184

@article{25c97fdab88f43249bd63ce345e8b1ae,

title = "Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy",

abstract = "A new resist formulation was successfully patterned using near field optical microscopy in order to simulate the conditions prevailing in silver based plasmonic imaging tools. Radiation at 476 nm was transmitted through a near field scanning optical microscopy fiber probe tip to cross-link a film of poly(4-methacrylmethyl styrene) via polymerization of pendant methacryloyl groups using camphorquinone and dimethyl aniline as an initiating system. Patterns were generated by scanning at several speeds in order to moderate the dose while maintaining a constant probe height of about 5 nm above the sample through shear force feedback. After development, lines corresponding to the exposed regions were observed. At a scanning speed of 4 μms, the observed pattern has a full width at half maximum of 275 nm and a height of ∼25 nm.",

author = "Backer, {Scott A.} and Itai Suez and Fresco, {Zachary M.} and F{\'r}chet, {Jean M.J.} and Conway, {Josh A.} and Shantha Vedantam and Hyojune Lee and Eli Yablonovitch",

note = "Funding Information: The authors thank the Center for Scaleable Integrated Nanomanufacturing (SINAM) funded by a grant of the National Science Foundation and SRC∕DARPA for the support of this research.",

year = "2007",

doi = "10.1116/1.2757184",

language = "English (US)",

volume = "25",

pages = "1336--1339",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "4",

}

Backer, SA, Suez, I, Fresco, ZM, Fŕchet, JMJ, Conway, JA, Vedantam, S, Lee, H & Yablonovitch, E 2007, 'Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 25, no. 4, pp. 1336-1339. https://doi.org/10.1116/1.2757184

Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy. / Backer, Scott A.; Suez, Itai; Fresco, Zachary M. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 25, No. 4, 2007, p. 1336-1339.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy

AU - Backer, Scott A.

AU - Suez, Itai

AU - Fresco, Zachary M.

AU - Fŕchet, Jean M.J.

AU - Conway, Josh A.

AU - Vedantam, Shantha

AU - Lee, Hyojune

AU - Yablonovitch, Eli

N1 - Funding Information: The authors thank the Center for Scaleable Integrated Nanomanufacturing (SINAM) funded by a grant of the National Science Foundation and SRC∕DARPA for the support of this research.

PY - 2007

Y1 - 2007

N2 - A new resist formulation was successfully patterned using near field optical microscopy in order to simulate the conditions prevailing in silver based plasmonic imaging tools. Radiation at 476 nm was transmitted through a near field scanning optical microscopy fiber probe tip to cross-link a film of poly(4-methacrylmethyl styrene) via polymerization of pendant methacryloyl groups using camphorquinone and dimethyl aniline as an initiating system. Patterns were generated by scanning at several speeds in order to moderate the dose while maintaining a constant probe height of about 5 nm above the sample through shear force feedback. After development, lines corresponding to the exposed regions were observed. At a scanning speed of 4 μms, the observed pattern has a full width at half maximum of 275 nm and a height of ∼25 nm.

AB - A new resist formulation was successfully patterned using near field optical microscopy in order to simulate the conditions prevailing in silver based plasmonic imaging tools. Radiation at 476 nm was transmitted through a near field scanning optical microscopy fiber probe tip to cross-link a film of poly(4-methacrylmethyl styrene) via polymerization of pendant methacryloyl groups using camphorquinone and dimethyl aniline as an initiating system. Patterns were generated by scanning at several speeds in order to moderate the dose while maintaining a constant probe height of about 5 nm above the sample through shear force feedback. After development, lines corresponding to the exposed regions were observed. At a scanning speed of 4 μms, the observed pattern has a full width at half maximum of 275 nm and a height of ∼25 nm.

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JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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ER -

Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy

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