Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography

V. Bellas^*, E. Tegou, I. Raptis, E. Gogolides, P. Argitis, H. Iatrou, N. Hadjichristidis, E. Sarantopoulou, A. C. Cefalas

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review