Keyphrases
InP Substrate
100%
Sol-gel
100%
SiO2 Film
100%
Cracking Behavior
100%
Silica Film
66%
Crack Pattern
66%
Spin Coating
33%
Annealing Temperature
33%
Silica Gel
33%
Volatility
33%
Amorphous Silica
33%
III-V Semiconductors
33%
Rapid Thermal Processing
33%
Sol-gel Film
33%
Engineering
Cracking Behavior
100%
Sio2 Film
100%
Theoretical Study
100%
Experimental Result
50%
Annealing Temperature
50%
Critical Thickness
50%
Rapid Thermal Processing
50%
III-V Semiconductor
50%
Material Science
Sol-Gel
100%
Film
100%
Annealing
20%
Spin Coating
20%
III-V Semiconductor
20%
Rapid Thermal Processing
20%
Amorphous Material
20%
Pharmacology, Toxicology and Pharmaceutical Science
Silicon Dioxide
100%
Sol-Gel
100%
Retinol
20%
Gelatin
20%