Fabrication of nanostructures using electron beam interference technique-a proposal

O. Gunawan, S. L. Ng, C. H. Ooi, B. S. Ooi, Y. L. Lam, Y. C. Chan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The fabrication and investigation of low dimensional semiconductor nanostructures have received increasing attention in recent years. The quasi one- and zero-dimensional structures have shown improved optical and electrical properties that increase device performance and enable development of novel devices. Many technological approaches have been developed to define ultrasmall semiconductor structures as in quantum wire and quantum dot fabrication. In this paper, a method based on electron beam interference, for nanostructures fabrication is proposed. Nanoscale wires or gratings, as well as dots, are generated using this method which is simple, maskless and of high throughput.

Original languageEnglish (US)
Title of host publicationCLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages314-315
Number of pages2
ISBN (Electronic)0780356616, 9780780356610
DOIs
StatePublished - 1999
Externally publishedYes
Event1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999 - Seoul, Korea, Republic of
Duration: Aug 30 1999Sep 3 1999

Publication series

NameCLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics
Volume2

Other

Other1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999
Country/TerritoryKorea, Republic of
CitySeoul
Period08/30/9909/3/99

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Computer Networks and Communications
  • General Physics and Astronomy

Fingerprint

Dive into the research topics of 'Fabrication of nanostructures using electron beam interference technique-a proposal'. Together they form a unique fingerprint.

Cite this