Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji; Borui Chen; Xie Zeng; Tania Moein; Haomin Song; Qiaoqiang Gan; Alexander Cartwright

doi:10.1364/CLEO_SI.2015.SM1G.6

Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Qiaoqiang Gan, Alexander Cartwright

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement. © OSA 2015.

Original language	English (US)
Title of host publication	CLEO: Science and Innovations, CLEO-SI 2015
Publisher	Optical Society of America (OSA)
ISBN (Print)	9781557529688
DOIs	https://doi.org/10.1364/CLEO_SI.2015.SM1G.6
State	Published - May 4 2015
Externally published	Yes

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10.1364/CLEO_SI.2015.SM1G.6

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title = "Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography",

abstract = "We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement. {\textcopyright} OSA 2015.",

author = "Dengxin Ji and Borui Chen and Xie Zeng and Tania Moein and Haomin Song and Qiaoqiang Gan and Alexander Cartwright",

note = "Generated from Scopus record by KAUST IRTS on 2022-09-13",

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month = may,

day = "4",

doi = "10.1364/CLEO_SI.2015.SM1G.6",

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T1 - Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

AU - Ji, Dengxin

AU - Chen, Borui

AU - Zeng, Xie

AU - Moein, Tania

AU - Song, Haomin

AU - Gan, Qiaoqiang

AU - Cartwright, Alexander

N1 - Generated from Scopus record by KAUST IRTS on 2022-09-13

PY - 2015/5/4

Y1 - 2015/5/4

N2 - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement. © OSA 2015.

AB - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement. © OSA 2015.

UR - https://opg.optica.org/abstract.cfm?URI=CLEO_SI-2015-SM1G.6

UR - http://www.scopus.com/inward/record.url?scp=84935515803&partnerID=8YFLogxK

U2 - 10.1364/CLEO_SI.2015.SM1G.6

DO - 10.1364/CLEO_SI.2015.SM1G.6

M3 - Conference contribution

SN - 9781557529688

BT - CLEO: Science and Innovations, CLEO-SI 2015

PB - Optical Society of America (OSA)

ER -

Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Abstract

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