Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography

Zachary M. Fresco*, Nicolas Bensel, Itai Suez, Scott A. Backer, Jean M.J. Fréchet, Will Conley

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

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Pharmacology, Toxicology and Pharmaceutical Science

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