Fluorocarbon resist for high-speed scanning probe lithography

Marco Rolandi; Itai Suez; Andreas Scholl; Jean M.J. Fréchet

doi:10.1002/anie.200701496

Fluorocarbon resist for high-speed scanning probe lithography

Marco Rolandi^*, Itai Suez, Andreas Scholl, Jean M.J. Fréchet

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

(Figure Presented) Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s^-1 range. Features as small as 27 nm are fabricated on 100-μm² areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.

Original language	English (US)
Pages (from-to)	7477-7480
Number of pages	4
Journal	Angewandte Chemie - International Edition
Volume	46
Issue number	39
DOIs	https://doi.org/10.1002/anie.200701496
State	Published - 2007
Externally published	Yes

Keywords

Electron microscopy
Mass spectrometry
Nanostructures
Scanning probe lithography
Surface chemistry

ASJC Scopus subject areas

General Chemistry
Catalysis

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10.1002/anie.200701496

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@article{185d2826b17c4b7298ee2f883d688633,

title = "Fluorocarbon resist for high-speed scanning probe lithography",

abstract = "(Figure Presented) Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.",

keywords = "Electron microscopy, Mass spectrometry, Nanostructures, Scanning probe lithography, Surface chemistry",

author = "Marco Rolandi and Itai Suez and Andreas Scholl and Fr{\'e}chet, {Jean M.J.}",

note = "Funding Information: This work was conducted under the Midwest Geological Sequestration Consortium which is funded by the U.S. Department of Energy through the National Energy Technology Laboratory (NETL) via the Regional Carbon Sequestration Partnership Program (contract number DE-FC26-05NT42588) and by a cost share agreement with the Illinois Department of Commerce and Economic Opportunity, Office of Coal Development through the Illinois Clean Coal Institute. ",

year = "2007",

doi = "10.1002/anie.200701496",

language = "English (US)",

volume = "46",

pages = "7477--7480",

journal = "Angewandte Chemie - International Edition",

issn = "1433-7851",

publisher = "Wiley",

number = "39",

}

TY - JOUR

T1 - Fluorocarbon resist for high-speed scanning probe lithography

AU - Rolandi, Marco

AU - Suez, Itai

AU - Scholl, Andreas

AU - Fréchet, Jean M.J.

N1 - Funding Information: This work was conducted under the Midwest Geological Sequestration Consortium which is funded by the U.S. Department of Energy through the National Energy Technology Laboratory (NETL) via the Regional Carbon Sequestration Partnership Program (contract number DE-FC26-05NT42588) and by a cost share agreement with the Illinois Department of Commerce and Economic Opportunity, Office of Coal Development through the Illinois Clean Coal Institute.

PY - 2007

Y1 - 2007

N2 - (Figure Presented) Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.

AB - (Figure Presented) Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.

KW - Electron microscopy

KW - Mass spectrometry

KW - Nanostructures

KW - Scanning probe lithography

KW - Surface chemistry

UR - http://www.scopus.com/inward/record.url?scp=35048901533&partnerID=8YFLogxK

U2 - 10.1002/anie.200701496

DO - 10.1002/anie.200701496

M3 - Article

C2 - 17702084

AN - SCOPUS:35048901533

SN - 1433-7851

VL - 46

SP - 7477

EP - 7480

JO - Angewandte Chemie - International Edition

JF - Angewandte Chemie - International Edition

IS - 39

ER -

Fluorocarbon resist for high-speed scanning probe lithography

Abstract

Keywords

ASJC Scopus subject areas

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