Focused ion beam lithography applied to photonic and imprinting

Stefano Cabrini; Scott Dhuey; Dan Cojoc; Alessandro Carpentiero; Massimo Tormen; Enzo Di Fabrizio

doi:10.1117/12.704814

Focused ion beam lithography applied to photonic and imprinting

Stefano Cabrini^*, Scott Dhuey, Dan Cojoc, Alessandro Carpentiero, Massimo Tormen, Enzo Di Fabrizio

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this paper we will discuss the use of the crossbeam ZEISS XB1540 applied to photonic structures and to obtain nanoimprinting templates. Some 1D Photonic Crystals (PhC) on silica based optical waveguides are shown as well as the realization of 3D optical structures curved directly on silica and used subsequently as a master for imprinting. Focused ion beam lithography (FIB) is a technique for direct writing of patterns; it means is substantially slow, but its versatility and the combination with other "faster" techniques make it an interesting method to produce prototypes and special devices. The resolution and the perturbation of the samples are perfectly compatible with the photonic applications. In fact, the contamination due to the gallium ion implantation as well as the roughness of the vertical and horizontal surface doesn't affect the performance of the devices shown in this paper.

Original language	English (US)
Title of host publication	Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII
Volume	6462
DOIs	https://doi.org/10.1117/12.704814
State	Published - 2007
Externally published	Yes
Event	Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII - San Jose, CA, United States Duration: Jan 22 2007 → Jan 24 2007

Other

Other	Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII
Country/Territory	United States
City	San Jose, CA
Period	01/22/07 → 01/24/07

Keywords

Focus ion beam lithography
Micro-lens
Nanoimprint lithography
Photonic crystal

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.704814

Cite this

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title = "Focused ion beam lithography applied to photonic and imprinting",

abstract = "In this paper we will discuss the use of the crossbeam ZEISS XB1540 applied to photonic structures and to obtain nanoimprinting templates. Some 1D Photonic Crystals (PhC) on silica based optical waveguides are shown as well as the realization of 3D optical structures curved directly on silica and used subsequently as a master for imprinting. Focused ion beam lithography (FIB) is a technique for direct writing of patterns; it means is substantially slow, but its versatility and the combination with other {"}faster{"} techniques make it an interesting method to produce prototypes and special devices. The resolution and the perturbation of the samples are perfectly compatible with the photonic applications. In fact, the contamination due to the gallium ion implantation as well as the roughness of the vertical and horizontal surface doesn't affect the performance of the devices shown in this paper.",

keywords = "Focus ion beam lithography, Micro-lens, Nanoimprint lithography, Photonic crystal",

author = "Stefano Cabrini and Scott Dhuey and Dan Cojoc and Alessandro Carpentiero and Massimo Tormen and {Di Fabrizio}, Enzo",

year = "2007",

doi = "10.1117/12.704814",

language = "English (US)",

isbn = "0819465755",

volume = "6462",

booktitle = "Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII",

note = "Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII ; Conference date: 22-01-2007 Through 24-01-2007",

}

Cabrini, S, Dhuey, S, Cojoc, D, Carpentiero, A, Tormen, M & Di Fabrizio, E 2007, Focused ion beam lithography applied to photonic and imprinting. in Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII. vol. 6462, 64620L, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, San Jose, CA, United States, 01/22/07. https://doi.org/10.1117/12.704814

TY - GEN

T1 - Focused ion beam lithography applied to photonic and imprinting

AU - Cabrini, Stefano

AU - Dhuey, Scott

AU - Cojoc, Dan

AU - Carpentiero, Alessandro

AU - Tormen, Massimo

AU - Di Fabrizio, Enzo

PY - 2007

Y1 - 2007

N2 - In this paper we will discuss the use of the crossbeam ZEISS XB1540 applied to photonic structures and to obtain nanoimprinting templates. Some 1D Photonic Crystals (PhC) on silica based optical waveguides are shown as well as the realization of 3D optical structures curved directly on silica and used subsequently as a master for imprinting. Focused ion beam lithography (FIB) is a technique for direct writing of patterns; it means is substantially slow, but its versatility and the combination with other "faster" techniques make it an interesting method to produce prototypes and special devices. The resolution and the perturbation of the samples are perfectly compatible with the photonic applications. In fact, the contamination due to the gallium ion implantation as well as the roughness of the vertical and horizontal surface doesn't affect the performance of the devices shown in this paper.

AB - In this paper we will discuss the use of the crossbeam ZEISS XB1540 applied to photonic structures and to obtain nanoimprinting templates. Some 1D Photonic Crystals (PhC) on silica based optical waveguides are shown as well as the realization of 3D optical structures curved directly on silica and used subsequently as a master for imprinting. Focused ion beam lithography (FIB) is a technique for direct writing of patterns; it means is substantially slow, but its versatility and the combination with other "faster" techniques make it an interesting method to produce prototypes and special devices. The resolution and the perturbation of the samples are perfectly compatible with the photonic applications. In fact, the contamination due to the gallium ion implantation as well as the roughness of the vertical and horizontal surface doesn't affect the performance of the devices shown in this paper.

KW - Focus ion beam lithography

KW - Micro-lens

KW - Nanoimprint lithography

KW - Photonic crystal

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U2 - 10.1117/12.704814

DO - 10.1117/12.704814

M3 - Conference contribution

AN - SCOPUS:34248660258

SN - 0819465755

SN - 9780819465757

VL - 6462

BT - Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII

T2 - Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII

Y2 - 22 January 2007 through 24 January 2007

ER -

Focused ion beam lithography applied to photonic and imprinting

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Keywords

ASJC Scopus subject areas

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