Formation and structure of epitaxial fe-films by targets-facing type of sputtering

En Yong Jiang, Xi Xiang Zhang, Jin E. Li, Yu Guang Liu

Research output: Contribution to journalArticlepeer-review


The epitaxial monocrystal Fe-films have first been prepared on the NaCl (100) substrate by means of targets-facing type of sputtering method. A series of electron diffraction patterns of the films are obtained by tilting around the b* axis. Electron diffraction structure analysis shows that the structure of the films corresponds to a tetragonal lattice with parameters a=b=5.86A and c=7.30A, containing four Fe-atoms, and its space group being l42d. The epitaxial growth process and the structures of the films depend strongly on substrate temperature (Ts), the thickness of the films (d), and the deposit rate (R).

Original languageEnglish (US)
Pages (from-to)2139-2140
Number of pages2
JournalIEEE Transactions on Magnetics
Issue number5
StatePublished - 1987
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Physics and Astronomy (miscellaneous)


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