Formation of long-range stripe patterns with sub-10-nm half-pitch from directed self-assembly of block copolymer

Mikihito Takenaka*, Shusuke Aburaya, Satoshi Akasaka, Hirokazu Hasegawa, Nikos Hadjichristidis, George Sakellariou, Yasuhiko Tada, Hiroshi Yoshida

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

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