Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

Meng Yu Lin; Yung Shuan Sheng; Shu Han Chen; Ching Yuan Su; Lain Jong Li; Shih Yen Lin

doi:10.1116/1.3646481

Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

Meng Yu Lin^*, Yung Shuan Sheng, Shu Han Chen, Ching Yuan Su, Lain Jong Li, Shih Yen Lin

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 10⁴ Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation.

Original language	English (US)
Article number	061202
Journal	Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume	29
Issue number	6
DOIs	https://doi.org/10.1116/1.3646481
State	Published - Nov 2011
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Process Chemistry and Technology
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

Access to Document

10.1116/1.3646481

Cite this

@article{c17ab3d88d094f6c9aa38de48e001572,

title = "Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications",

abstract = "An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 104 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation.",

author = "Lin, {Meng Yu} and Sheng, {Yung Shuan} and Chen, {Shu Han} and Su, {Ching Yuan} and Li, {Lain Jong} and Lin, {Shih Yen}",

note = "Funding Information: This work was supported in part by the National Science Council, Taiwan, under Grant Nos. NSC 100-2628-E-001-001 and NSC 99-2112-M-001-021-MY3.",

year = "2011",

month = nov,

doi = "10.1116/1.3646481",

language = "English (US)",

volume = "29",

journal = "Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics",

issn = "2166-2746",

publisher = "AIP Publishing",

number = "6",

}

TY - JOUR

T1 - Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

AU - Lin, Meng Yu

AU - Sheng, Yung Shuan

AU - Chen, Shu Han

AU - Su, Ching Yuan

AU - Li, Lain Jong

AU - Lin, Shih Yen

N1 - Funding Information: This work was supported in part by the National Science Council, Taiwan, under Grant Nos. NSC 100-2628-E-001-001 and NSC 99-2112-M-001-021-MY3.

PY - 2011/11

Y1 - 2011/11

N2 - An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 104 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation.

AB - An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 104 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation.

UR - http://www.scopus.com/inward/record.url?scp=84255190047&partnerID=8YFLogxK

U2 - 10.1116/1.3646481

DO - 10.1116/1.3646481

M3 - Article

AN - SCOPUS:84255190047

SN - 2166-2746

VL - 29

JO - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

JF - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

IS - 6

M1 - 061202

ER -

Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this