Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

Chao Zhao; Mohamed N. Hedhili; Jingqi Li; Qingxiao Wang; Yang Yang; Long Chen; LIANG LI

doi:10.1016/j.tsf.2013.06.010

Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

Chao Zhao, Mohamed N. Hedhili, Jingqi Li, Qingxiao Wang, Yang Yang, Long Chen, LIANG LI

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.

Original language	English (US)
Pages (from-to)	38-44
Number of pages	7
Journal	Thin Solid Films
Volume	542
DOIs	https://doi.org/10.1016/j.tsf.2013.06.010
State	Published - Sep 2013

ASJC Scopus subject areas

Materials Chemistry
Surfaces and Interfaces
Electronic, Optical and Magnetic Materials
Surfaces, Coatings and Films
Metals and Alloys

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title = "Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition",

abstract = "The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. {\textcopyright} 2013 Elsevier B.V. All rights reserved.",

author = "Chao Zhao and Hedhili, {Mohamed N.} and Jingqi Li and Qingxiao Wang and Yang Yang and Long Chen and LIANG LI",

note = "KAUST Repository Item: Exported on 2020-10-01",

year = "2013",

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T1 - Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

AU - Zhao, Chao

AU - Hedhili, Mohamed N.

AU - Li, Jingqi

AU - Wang, Qingxiao

AU - Yang, Yang

AU - Chen, Long

AU - LI, LIANG

N1 - KAUST Repository Item: Exported on 2020-10-01

PY - 2013/9

Y1 - 2013/9

N2 - The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.

AB - The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.

UR - http://hdl.handle.net/10754/562935

UR - https://linkinghub.elsevier.com/retrieve/pii/S0040609013009784

UR - http://www.scopus.com/inward/record.url?scp=84881314131&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2013.06.010

DO - 10.1016/j.tsf.2013.06.010

M3 - Article

SN - 0040-6090

VL - 542

SP - 38

EP - 44

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

Abstract

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