INIS
sputtering
100%
growth
100%
films
100%
thin films
100%
titanium oxides
100%
magnetic properties
100%
range
50%
magnetism
50%
layers
50%
surfaces
50%
alloys
50%
morphology
50%
values
50%
substrates
50%
deposition
50%
saturation
50%
epitaxy
50%
charge carriers
50%
Physics
Thin Films
100%
Magnetic Properties
100%
Growth
100%
Magnetism
50%
Shapes
50%
Independent Variables
50%
Substrates
50%
Value
50%
Deposition
50%
Alloy
50%
Existence
50%
Material Science
Thin Films
100%
Titanium Dioxide
100%
Magnetic Property
100%
Alloy
50%
Surface Morphology
50%
Saturation
50%
Charge Carrier
50%
Magnetism
50%
Engineering
Thin Films
100%
Properties
100%
Surface Morphology
50%
Charge Carrier
50%
Deposition Parameter
50%
Substrates
50%
Alloy
50%